新型相分离IBS工艺的优化

M. Jupé, T. Willemsen, S. Malobabić, K. Schuba, D. Ristau
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引用次数: 1

摘要

近年来,光学低损耗元件越来越受到工业的关注,并为光学镀膜技术的生产带来了新的途径。过滤沉积技术的应用有望显著减少颗粒污染。通常,过滤技术与产生高水平不希望的颗粒的工艺结合使用,如阴极电弧沉积。在本论文中,磁场滤波器与高质量离子束溅射工艺相结合。研究的重点是引导过程对引导效率的调节。数值研究揭示了离子在引导过程中的轨迹,并允许分析磁场和由此产生的静电势的影响。在本研究中,我们观察到与磁场相比,电势主导了引导效应。然而,根据模拟,在适当的磁场和电势下可以实现非常高的离子引导效率。实验结果与计算结果吻合较好。因此,模拟是进一步优化过滤离子束溅射过程的基础。
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Optimization of novel phase separating IBS process
During the last years, optical low loss components gained more and more industrial interest and led to novel approaches for the production in optical coating technology. The application of filtered deposition technologies promises a significant reduction of particle contamination. Usually, filtered techniques are applied in combination with processes which produce a high level of undesired particles, like the cathodic arc deposition. In the present contribution, a magnetic field filter is applied in combination with a high quality ion beam sputtering process. The focus of the investigation constitutes the modulation of the guiding process with respect to the guiding efficiency. Numerical investigations reveal the trajectories of the ions during the guiding process and allow to analyze the influence of the magnetic field and the resulting electrostatic potential. In this study, the guiding effect is observed to be dominated by the electric potential compared to the magnetic field. However according to the simulations, very high ion guiding efficiencies can be achieved using moderate magnetic fields and electrical potentials. Furthermore, it is demonstrated that the experiemental and calculated efficiencies agree well. Consequently, the simulation is the basis for a further optimization of the filtered ion beam sputtering processes.
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