The Nikon Metrology Laser Radar system focuses a beam from a fiber to a target object and receives the light scattered from the target through the same fiber. The system can, among other things, make highly accurate measurements of the position of a tooling ball by locating the angular position of peak signal quality, which is related to the fiber coupling efficiency. This article explores the relationship between fiber coupling efficiency and focus condition.
{"title":"Simulation of laser radar tooling ball measurements: focus dependence","authors":"Daniel G. Smith, A. Slotwinski, Thomas W. Hedges","doi":"10.1117/12.2191766","DOIUrl":"https://doi.org/10.1117/12.2191766","url":null,"abstract":"The Nikon Metrology Laser Radar system focuses a beam from a fiber to a target object and receives the light scattered from the target through the same fiber. The system can, among other things, make highly accurate measurements of the position of a tooling ball by locating the angular position of peak signal quality, which is related to the fiber coupling efficiency. This article explores the relationship between fiber coupling efficiency and focus condition.","PeriodicalId":212434,"journal":{"name":"SPIE Optical Systems Design","volume":"5 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-10-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126941886","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
We collect the scorpions, Isometrus maculates, in different instars to analyze the photoluminescence (PL), micro‐structure of cuticles and their correlation. The photoluminescence is excited by 405 nm solid laser in room temperature and detected by BWtek BRC 112E spectrometer. The result shows that the intensity of photoluminescence positively correlate to instars of scorpion. The images of micro‐structures of cuticles captured by scanning electron microscope (SEM) present the multilayer structure in detail. The samples are prepared in small piece to ensure that the PL and SEM data are caught from the same area. The correlation between instars and intensity of photoluminescence is explained according to micro‐structures via the thin‐film optics theory.
{"title":"Fluorescence and multilayer structure of the scorpion cuticle","authors":"Yu‐Jen Chen, Pei-Ju Chiu, Cheng-chung Lee","doi":"10.1117/12.2191224","DOIUrl":"https://doi.org/10.1117/12.2191224","url":null,"abstract":"We collect the scorpions, Isometrus maculates, in different instars to analyze the photoluminescence (PL), micro‐structure of cuticles and their correlation. The photoluminescence is excited by 405 nm solid laser in room temperature and detected by BWtek BRC 112E spectrometer. The result shows that the intensity of photoluminescence positively correlate to instars of scorpion. The images of micro‐structures of cuticles captured by scanning electron microscope (SEM) present the multilayer structure in detail. The samples are prepared in small piece to ensure that the PL and SEM data are caught from the same area. The correlation between instars and intensity of photoluminescence is explained according to micro‐structures via the thin‐film optics theory.","PeriodicalId":212434,"journal":{"name":"SPIE Optical Systems Design","volume":"52 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-10-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126055608","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
M. Rodenhuis, P. Tol, T. Coppens, P. Laubert, A. V. van Amerongen
The use of Immersed Gratings offers advantages for both space- and ground-based spectrographs. As diffraction takes place inside the high-index medium, the optical path difference and angular dispersion are boosted proportionally, thereby allowing a smaller grating area and a smaller spectrometer size. Short-wave infrared (SWIR) spectroscopy is used in space-based monitoring of greenhouse and pollution gases in the Earth atmosphere. On the extremely large telescopes currently under development, mid-infrared high-resolution spectrographs will, among other things, be used to characterize exo-planet atmospheres. At infrared wavelengths, Silicon is transparent. This means that production methods used in the semiconductor industry can be applied to the fabrication of immersed gratings. Using such methods, we have designed and built immersed gratings for both space- and ground-based instruments, examples being the TROPOMI instrument for the European Space Agency Sentinel-5 precursor mission, Sentinel-5 (ESA) and the METIS (Mid-infrared E-ELT Imager and Spectrograph) instrument for the European Extremely Large Telescope. Three key parameters govern the performance of such gratings: The efficiency, the level of scattered light and the wavefront error induced. In this paper we describe how we can optimize these parameters during the design and manufacturing phase. We focus on the tools and methods used to measure the actual performance realized and present the results. In this paper, the bread-board model (BBM) immersed grating developed for the SWIR-1 channel of Sentinel-5 is used to illustrate this process. Stringent requirements were specified for this grating for the three performance criteria. We will show that –with some margin– the performance requirements have all been met.
{"title":"Performance of silicon immersed gratings: measurement, analysis, and modeling","authors":"M. Rodenhuis, P. Tol, T. Coppens, P. Laubert, A. V. van Amerongen","doi":"10.1117/12.2191266","DOIUrl":"https://doi.org/10.1117/12.2191266","url":null,"abstract":"The use of Immersed Gratings offers advantages for both space- and ground-based spectrographs. As diffraction takes place inside the high-index medium, the optical path difference and angular dispersion are boosted proportionally, thereby allowing a smaller grating area and a smaller spectrometer size. Short-wave infrared (SWIR) spectroscopy is used in space-based monitoring of greenhouse and pollution gases in the Earth atmosphere. On the extremely large telescopes currently under development, mid-infrared high-resolution spectrographs will, among other things, be used to characterize exo-planet atmospheres. At infrared wavelengths, Silicon is transparent. This means that production methods used in the semiconductor industry can be applied to the fabrication of immersed gratings. Using such methods, we have designed and built immersed gratings for both space- and ground-based instruments, examples being the TROPOMI instrument for the European Space Agency Sentinel-5 precursor mission, Sentinel-5 (ESA) and the METIS (Mid-infrared E-ELT Imager and Spectrograph) instrument for the European Extremely Large Telescope. Three key parameters govern the performance of such gratings: The efficiency, the level of scattered light and the wavefront error induced. In this paper we describe how we can optimize these parameters during the design and manufacturing phase. We focus on the tools and methods used to measure the actual performance realized and present the results. In this paper, the bread-board model (BBM) immersed grating developed for the SWIR-1 channel of Sentinel-5 is used to illustrate this process. Stringent requirements were specified for this grating for the three performance criteria. We will show that –with some margin– the performance requirements have all been met.","PeriodicalId":212434,"journal":{"name":"SPIE Optical Systems Design","volume":"109 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-10-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"117190035","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Manufacturing all dielectric mirror coating with reflectivity values of more than 99.99 % is still a challenge to achieve. Losses caused either be transmittance, absorption or scattering have to be maintained well below 100ppm. Increasing the layer number for minimizing the transmittance losses usually increases the scattering by the growth of the roughness. High energy processes are required to minimize or avoid this behavior, but which are a challenge for avoiding unwanted contamination and interface absorption due to unwanted sputtering. As high energy process we used for the preparation of high reflecting dielectric mirrors plasma assisted reactive magnetron sputtering with a Helios 800 system. The machine was equipped with 3 cathode position for low and high index materials. We used metallic tantalum and hafnium targets for the preparation of the high index, silicon and silica targets for the low index. Metallic targets were powered with mid frequency, whereas the quartz target was sputtered by RF. As substrate we used either super polished fused silica or standard silicon wafer. The optical properties of the substrates we characterized by CRD, Laser calorimetry and spectrophotometric measurements. All combination allowed us to reach reflectivity values above 99.99%, with total deficit levels as low as 36ppm.
{"title":"High reflecting dielectric mirror coatings deposited with plasma assisted reactive magnetron sputtering","authors":"H. Hagedorn, J. Pistner","doi":"10.1117/12.2191350","DOIUrl":"https://doi.org/10.1117/12.2191350","url":null,"abstract":"Manufacturing all dielectric mirror coating with reflectivity values of more than 99.99 % is still a challenge to achieve. Losses caused either be transmittance, absorption or scattering have to be maintained well below 100ppm. Increasing the layer number for minimizing the transmittance losses usually increases the scattering by the growth of the roughness. High energy processes are required to minimize or avoid this behavior, but which are a challenge for avoiding unwanted contamination and interface absorption due to unwanted sputtering. As high energy process we used for the preparation of high reflecting dielectric mirrors plasma assisted reactive magnetron sputtering with a Helios 800 system. The machine was equipped with 3 cathode position for low and high index materials. We used metallic tantalum and hafnium targets for the preparation of the high index, silicon and silica targets for the low index. Metallic targets were powered with mid frequency, whereas the quartz target was sputtered by RF. As substrate we used either super polished fused silica or standard silicon wafer. The optical properties of the substrates we characterized by CRD, Laser calorimetry and spectrophotometric measurements. All combination allowed us to reach reflectivity values above 99.99%, with total deficit levels as low as 36ppm.","PeriodicalId":212434,"journal":{"name":"SPIE Optical Systems Design","volume":"57 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-10-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123631768","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Meihdi Oussalah, F. Pradal, B. Portier, D. Mouricaud, H. Sik, J. Fleury, P. Laprat
High end applications in infrared may benefit from infrared colorimetry. Actual systems are designed using filter wheel, gratings or dichroic components. Those systems are bulky, do not allow real-time acquisition and are sensitive to stray light. Sagem & Reosc recently developed technologies to pixelate infrared coating filters at detector level. It allows designing very compact systems, easy to cool down and to significantly reduce ghost images. Optical systems are simplified and can achieve fast acquisition of multi-spectral video. Numerical simulations have been performed in order to quantify the pattern shape influence on the optical performances at the microscopic scale. The etching processes of multilayer stacks have been developed. Finally, prototypes have been manufactured and tested. This technology opens up new perspectives in the field of infrared filtering.
{"title":"Multispectral thin film coating on infrared detector","authors":"Meihdi Oussalah, F. Pradal, B. Portier, D. Mouricaud, H. Sik, J. Fleury, P. Laprat","doi":"10.1117/12.2190981","DOIUrl":"https://doi.org/10.1117/12.2190981","url":null,"abstract":"High end applications in infrared may benefit from infrared colorimetry. Actual systems are designed using filter wheel, gratings or dichroic components. Those systems are bulky, do not allow real-time acquisition and are sensitive to stray light. Sagem & Reosc recently developed technologies to pixelate infrared coating filters at detector level. It allows designing very compact systems, easy to cool down and to significantly reduce ghost images. Optical systems are simplified and can achieve fast acquisition of multi-spectral video. Numerical simulations have been performed in order to quantify the pattern shape influence on the optical performances at the microscopic scale. The etching processes of multilayer stacks have been developed. Finally, prototypes have been manufactured and tested. This technology opens up new perspectives in the field of infrared filtering.","PeriodicalId":212434,"journal":{"name":"SPIE Optical Systems Design","volume":"97 ","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-10-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"113991497","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
S. Wickenhagen, K. Endo, U. Fuchs, R. Youngworth, S. Kiontke
Manufacturing optical components relies on good measurements and specifications. One of the most precise measurements routinely required is the form accuracy. In practice, form deviation from the ideal surface is effectively low frequency errors, where the form error most often accounts for no more than a few undulations across a surface. These types of errors are measured in a variety of ways including interferometry and tactile methods like profilometry, with the latter often being employed for aspheres and general surface shapes such as freeforms. This paper provides a basis for a correct description of power and radius of curvature tolerances, including best practices and calculating the power value with respect to the radius deviation (and vice versa) of the surface form. A consistent definition of the sagitta is presented, along with different cases in manufacturing that are of interest to fabricators and designers. The results make clear how the definitions and results should be documented, for all measurement setups. Relationships between power and radius of curvature are shown that allow specifying the preferred metric based on final accuracy and measurement method. Results shown include all necessary equations for conversion to give optical designers and manufacturers a consistent and robust basis for decision-making. The paper also gives guidance on preferred methods for different scenarios for surface types, accuracy required, and metrology methods employed.
{"title":"Conversion of radius of curvature to power (and vice versa)","authors":"S. Wickenhagen, K. Endo, U. Fuchs, R. Youngworth, S. Kiontke","doi":"10.1117/12.2191400","DOIUrl":"https://doi.org/10.1117/12.2191400","url":null,"abstract":"Manufacturing optical components relies on good measurements and specifications. One of the most precise measurements routinely required is the form accuracy. In practice, form deviation from the ideal surface is effectively low frequency errors, where the form error most often accounts for no more than a few undulations across a surface. These types of errors are measured in a variety of ways including interferometry and tactile methods like profilometry, with the latter often being employed for aspheres and general surface shapes such as freeforms. This paper provides a basis for a correct description of power and radius of curvature tolerances, including best practices and calculating the power value with respect to the radius deviation (and vice versa) of the surface form. A consistent definition of the sagitta is presented, along with different cases in manufacturing that are of interest to fabricators and designers. The results make clear how the definitions and results should be documented, for all measurement setups. Relationships between power and radius of curvature are shown that allow specifying the preferred metric based on final accuracy and measurement method. Results shown include all necessary equations for conversion to give optical designers and manufacturers a consistent and robust basis for decision-making. The paper also gives guidance on preferred methods for different scenarios for surface types, accuracy required, and metrology methods employed.","PeriodicalId":212434,"journal":{"name":"SPIE Optical Systems Design","volume":"57 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-10-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116741239","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Predictable and stable fabrication processes are essential for reliable cost and quality management in optical fabrication technology. This paper reports on strategies to generate and control optimum sets of process parameters for e.g. sub-aperture polishing of small optics (featuring clear apertures smaller than 2 mm). Emphasis is placed to distinguish between machine and process optimization demonstrating, that e.g. it is possible setting up ductile mode grinding process by other means than controlling critical depth of cut. Finally, a recently developed in situ testing technique is applied to monitor surface quality on-machine while abrasively working the surface under test enabling an on-line optimization of polishing processes eventually minimizing polishing time and fabrication cost.
{"title":"Process control in optical fabrication","authors":"O. Faehnle","doi":"10.1117/12.2191881","DOIUrl":"https://doi.org/10.1117/12.2191881","url":null,"abstract":"Predictable and stable fabrication processes are essential for reliable cost and quality management in optical fabrication technology. This paper reports on strategies to generate and control optimum sets of process parameters for e.g. sub-aperture polishing of small optics (featuring clear apertures smaller than 2 mm). Emphasis is placed to distinguish between machine and process optimization demonstrating, that e.g. it is possible setting up ductile mode grinding process by other means than controlling critical depth of cut. Finally, a recently developed in situ testing technique is applied to monitor surface quality on-machine while abrasively working the surface under test enabling an on-line optimization of polishing processes eventually minimizing polishing time and fabrication cost.","PeriodicalId":212434,"journal":{"name":"SPIE Optical Systems Design","volume":"9628 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-10-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130858028","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
After a recall of some basic concepts in close relationship with the definition of the refractive index of a material, we will perform a sweep of the specific properties of some important classes of metamaterials, such as NIM, ENZ or ZIM. These fundamentals will allow us to examine the possible benefits induced by the use of one or more NIM layers into the formula of standard filtering functions, like Bragg quarter-wavelength mirror, Fabry-Perot band-pass filter or antireflective coatings. As a conclusion, we will deal some practical issues showing possible implementation ways for these new and attractive concepts.
{"title":"Metamaterials and optical filtering functions: a review","authors":"M. Lequime, C. Amra","doi":"10.1117/12.2192073","DOIUrl":"https://doi.org/10.1117/12.2192073","url":null,"abstract":"After a recall of some basic concepts in close relationship with the definition of the refractive index of a material, we will perform a sweep of the specific properties of some important classes of metamaterials, such as NIM, ENZ or ZIM. These fundamentals will allow us to examine the possible benefits induced by the use of one or more NIM layers into the formula of standard filtering functions, like Bragg quarter-wavelength mirror, Fabry-Perot band-pass filter or antireflective coatings. As a conclusion, we will deal some practical issues showing possible implementation ways for these new and attractive concepts.","PeriodicalId":212434,"journal":{"name":"SPIE Optical Systems Design","volume":"546 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-10-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131901332","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Huiying Zhong, Site Zhang, Rui Shi, C. Hellmann, F. Wyrowski
Ray tracing and split-step method are the most efficient techniques to model multi-mode fiber. In this work, we also propose a geometrical optics based approach, which is beyond ray tracing. This approach, which is mathematically based on Runge-Kutta methods, handles not only ray information but light field information, e.g. amplitude and polarization. Then we discuss and compare the different techniques by the example of coupling of a VCSEL source into a multi-mode fiber.
{"title":"Comparison of modelling techniques for multimode fibers and its application to VCSEL source coupling","authors":"Huiying Zhong, Site Zhang, Rui Shi, C. Hellmann, F. Wyrowski","doi":"10.1117/12.2192425","DOIUrl":"https://doi.org/10.1117/12.2192425","url":null,"abstract":"Ray tracing and split-step method are the most efficient techniques to model multi-mode fiber. In this work, we also propose a geometrical optics based approach, which is beyond ray tracing. This approach, which is mathematically based on Runge-Kutta methods, handles not only ray information but light field information, e.g. amplitude and polarization. Then we discuss and compare the different techniques by the example of coupling of a VCSEL source into a multi-mode fiber.","PeriodicalId":212434,"journal":{"name":"SPIE Optical Systems Design","volume":"106 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-10-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"117177199","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Dam-be Douti, L. Gallais, C. Hecquet, T. Begou, J. Lumeau, M. Commandré
We report on the sub-picosecond laser-induced damage of optical thin films of different thickness made by Magnetron sputtering, Ion assisted deposition and Ion plating, and submitted to single irradiation of the first and the third harmonics of an Ytterbium laser (1030 and 343nm). Using a single rate equation approach for free electron excitation coupled with calculation of the spatial and temporal distribution of the electric field, we investigate numerically the spatial density distribution of the absorbed energy and evaluate its capacity to describe damage phenomena especially damage threshold and morphologies (damage diameter, ablation deepness). Laser-induced damage thresholds are compared for different film thicknesses and different irradiation conditions.
{"title":"Analysis of energy deposition and damage mechanisms in single layer optical thin films irradiated by IR and UV femtosecond pulses","authors":"Dam-be Douti, L. Gallais, C. Hecquet, T. Begou, J. Lumeau, M. Commandré","doi":"10.1117/12.2192983","DOIUrl":"https://doi.org/10.1117/12.2192983","url":null,"abstract":"We report on the sub-picosecond laser-induced damage of optical thin films of different thickness made by Magnetron sputtering, Ion assisted deposition and Ion plating, and submitted to single irradiation of the first and the third harmonics of an Ytterbium laser (1030 and 343nm). Using a single rate equation approach for free electron excitation coupled with calculation of the spatial and temporal distribution of the electric field, we investigate numerically the spatial density distribution of the absorbed energy and evaluate its capacity to describe damage phenomena especially damage threshold and morphologies (damage diameter, ablation deepness). Laser-induced damage thresholds are compared for different film thicknesses and different irradiation conditions.","PeriodicalId":212434,"journal":{"name":"SPIE Optical Systems Design","volume":"22 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-10-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132660787","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
京公网安备 11010802042870号
京ICP备2023020795号-1
扫码关注我们
求助内容：
应助结果提醒方式：