红外成像阵列采用先进的III-V材料和技术

M. Razeghi, J.D. Kim, C. Jelen, S. Slivken, E. Michel, H. Mohseini, J.J. Lee, J. Wojkowski, K. Kim, H. Jeon, J. Xu
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引用次数: 1

摘要

在3-5和8-12 /spl μ m大气窗口中工作的光电探测器对于红外热成像的应用具有重要意义。HgCdTe一直是这些应用的主导材料体系。然而,在材料生长过程中,由于高汞蒸气压,它在大面积上存在不稳定性和不均匀性问题。人们对利用异质外延生长的sb基合金及其应变层超晶格和GaAs基量子阱作为MCT的替代品非常感兴趣。这种兴趣是由先进的材料生长和加工技术驱动的,可用于III-V材料系统。
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Infrared imaging arrays using advanced III-V materials and technology
Photodetectors operating in the 3-5 and 8-12 /spl mu/m atmospheric windows are of great importance for applications in infrared (IR) thermal imaging. HgCdTe has been the dominant material system for these applications. However, it suffers from instability and non-uniformity problems over large areas due to high Hg vapor pressure during the material, growth. There has been a lot of interest in the use of heteroepitaxially grown Sb-based alloys, its strained layer superlattices, and GaAs based quantum wells as alternatives to MCT. This interest has been driven by the advanced material growth and processing technology available for the III-V material system.
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