离子杂质对硅纳米线MOS晶体管的影响

M. Bescond, M. Lannoo, L. Raymond, F. Michelini, M. Pala
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引用次数: 1

摘要

研究了离子杂质对硅纳米线MOS晶体管的影响。我们首先用自一致的三维(3D)格林函数方法计算了电流特性,并展示了受体和供体杂质对物理电子特性的影响。特别地,我们强调了供体的存在根据所施加的栅极偏压引起不同的输运现象。考虑到有吸引力的库仑势,我们然后通过比较立方点的局域状态和通过sp3第三近邻紧密结合模型获得的局域状态来评估有效质量的有效性。我们的结果表明,在第一近似下,有效质量仍然适合于处理电离杂质。
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Influence of Ionized Impurities in Silicon Nanowire MOS Transistors
This study presents ionized impurity impacts on silicon nanowire MOS transistors. We first calculate the current characteristics with a self-consistent three-dimensional (3D) Green's function approach and show the effects of both acceptor and donor impurities on the physical electron properties. In particular, we emphasize that the presence of a donor induces different transport phenomena according to the applied gate bias. Considering an attractive Coulomb potential, we then evaluate the effective mass validity by comparing the localized states of cubic dots with those obtained through a sp 3 third-neighbor tight-binding model. Our results show that in first approximation, the effective mass is still adapted to treat ionized impurities.
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