石墨烯互连的可靠性与碳纳米管晶体管的n型掺杂

L. Liyanage, Xiangyu Chen, Hai Wei, Hong-Yu Chen, S. Mitra, H. Wong
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引用次数: 2

摘要

石墨烯和碳纳米管因其在高性能电子领域的潜在应用而备受关注。为了用碳基电子技术取代或集成目前的硅基技术,人们应该研究这些设备的可靠性,以了解其应用的可行性。在本报告中,我们介绍了CVD合成石墨烯用于晶体管互连的可靠性,并研究了金属氧化物碳纳米管掺杂技术的可靠性,这是当前碳纳米管社区研究的一个活跃领域。
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Reliability of graphene interconnects and n-type doping of carbon nanotube transistors
Graphene and carbon nanotubes (CNTs) have gained significant attention due to their potential applications in high performance electronics. In order to replace or integrate the current silicon based technology with carbon based electronics one should study the reliability of those devices to understand the feasibility of their applications. In this report we present the reliability of CVD synthesized graphene for transistor interconnects and also investigate the reliability of a metal-oxide based CNT doping technique that is an active area of research in the current CNT community.
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