K. Murakami, N. Yamasaki, S. Abo, F. Wakaya, M. Takai
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Observation of electron emission pattern from nano-split emitter fabricated using beam assisted process
The possibility of interference of electrons from a nano-split emitter fabricated using beam assisted processes has been investigated. With the gap size of 16 nm, the emission pattern with two spots was observed at a gate voltage close to the turn-on voltage. At the higher gate voltages, two spots become overlapped but no interference fringes were observed at room temperature.
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