一种新型GaN功率场效应管可靠性模型

G. Golan, M. Azoulay, S. Shaheen, J. Bernstein
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引用次数: 1

摘要

现有的功率器件标准可靠性模型在预测半导体产品的故障率或损耗寿命方面存在不足。这主要归因于两个原因;缺乏统一的方法来预测设备故障率,以及所有商业可靠性评估方法都依赖于一种主要失效机制的加速。最近,设备可靠性研究计划旨在开发新的理论模型和实验方法,以更好地评估设备寿命,并指出特定操作条件下的主要失效机制。介绍了一种新的模型,称为多失效机制,超应力寿命测试(MOL),并对先进FPGA器件(用于45nm和28nm技术)在各种应力条件下的主要失效机制进行了更好的理解。最近,我们首次提出了MOL模型的实现,以研究硅功率MOSFET器件的可靠性。给出了基于CMOS-FET、NMOS-FET和PMOS-FET的环形振荡器测试电路的LT Spice仿真和实验数据。现场监测数据以环频率或Vds值的形式获得,可以评估寿命并确定温度、施加偏置电压、热循环、伽马和电子辐照加速磨损过程中的主导机制。在本文中,我们扩展了我们的研究,用我们新开发的MOL模型来研究GaN HEMT的可靠性。包含所有GaN器件和混合(GaN HEMT-Si MOSFET)的复杂RO电路已经过测试。在被测部件热循环过程中运行了Rds-on监测电路,并推导了各种运行参数下的加速度因子。值得注意的是,所提供的数据是第一次尝试监测GaN器件在加速磨损条件下的原位降解率。然而,我们仍在努力扩展实验结果,旨在确定完整的多机制矩阵。
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A Novel Reliability Model For GaN Power FET
The existing standard reliability models for power devices are not satisfactory and they fall short of predicting failure rates or wear-out lifetime of semiconductor products. This is mainly attributed to two reasons; the lack of a unified approach for predicting device failure rates and the fact that all commercial reliability evaluation methods relay on the acceleration of one dominant failure mechanism. Recently, device reliability research programs are aimed to develop new theoretical models and experimental methods that would result at a better assessment of the device lifetime as well as point out on the dominating failure mechanism for particular operating conditions. A novel model, named Multi-failure mechanism, Overstress Life test (MOL) has been introduced and posed a better understanding of the dominating failure mechanisms under various stressed conditions in advanced FPGA devices (for 45nm and 28nm technologies). More recently, we have presented, for the first time, the implementation of the MOL model to investigate the reliability of silicon power MOSFET devices. Both, LT Spice simulation and experimental data were presented for a test circuit of a ring oscillator, based on CMOS-FET, NMOS-FET and PMOS-FET. The monitored data was acquired in-situ in form of the ring frequency or Vds values that enabled to assess the lifetime and determine the dominating mechanism during accelerated wear-out by temperature, applied bias voltage, thermal cycling, gamma and electron irradiation. In this paper, we extend our study to investigate GaN HEMT reliability by our newly developed MOL model. Complex RO circuits containing all GaN devices and mixed (GaN HEMT-Si MOSFET) have been tested. Rds-on monitoring circuit has also been operated during thermal cycling of the tested component and the acceleration factor was derived for various operational parameters. It is noted that the presented data is the first attempt to monitor the GaN device degradation rate in-situ, during accelerated wear-out conditions. However, we are still working to extend the experimental results, aimed to determine the full multi mechanism matrix.
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