高数值孔径固体浸没透镜激光成像可见光探测的超薄体硅减薄

T. W. Siang, S. Wei, C. Richardson
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引用次数: 1

摘要

随着工艺技术的日益小型化,对样品制备工艺、精确控制和可见光计量工具获得超薄样品的要求越来越高,可见光探测技术在提高空间分辨率方面变得越来越重要。目前采用数控轮廓铣削工艺制备样品,剩余硅厚度为$50\ \mu \ mathm {m}$,公差为$50\ \mu \ mathm {m}$。在这项工作中,提出了一种新的工艺,可以显着缩短工艺时间,并使样品的公差降低到低于$5\ \mu \ \mathrm{m}$厚度,与可见光探测技术兼容。
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Ultra-thin Bulk Silicon Thinning for Visible Light Probing with High Numerical Aperture Solid Immersion Lens Laser Imaging
Visible Light Probing techniques are of mounting importance in improving the spatial resolution for increasingly miniaturized process technologies and demands of the sample preparation processes, precise control, and visible light metrology tools to obtain ultra-thinned samples. Current CNC contour milling processes are employed to prepare samples at $50\ \mu \mathrm{m}$ remaining silicon thicknesses to $\pm 5 \mu \mathrm{m}$ tolerances. In this work, a new process is proposed to significantly reduce process time and to prepare samples to tighter tolerances down to sub- $5\ \mu \mathrm{m}$ thicknesses compatible with Visible Light Probing techniques.
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