{"title":"高数值孔径固体浸没透镜激光成像可见光探测的超薄体硅减薄","authors":"T. W. Siang, S. Wei, C. Richardson","doi":"10.1109/IPFA.2018.8452609","DOIUrl":null,"url":null,"abstract":"Visible Light Probing techniques are of mounting importance in improving the spatial resolution for increasingly miniaturized process technologies and demands of the sample preparation processes, precise control, and visible light metrology tools to obtain ultra-thinned samples. Current CNC contour milling processes are employed to prepare samples at $50\\ \\mu \\mathrm{m}$ remaining silicon thicknesses to $\\pm 5 \\mu \\mathrm{m}$ tolerances. In this work, a new process is proposed to significantly reduce process time and to prepare samples to tighter tolerances down to sub- $5\\ \\mu \\mathrm{m}$ thicknesses compatible with Visible Light Probing techniques.","PeriodicalId":382811,"journal":{"name":"2018 IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2018-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Ultra-thin Bulk Silicon Thinning for Visible Light Probing with High Numerical Aperture Solid Immersion Lens Laser Imaging\",\"authors\":\"T. W. Siang, S. Wei, C. Richardson\",\"doi\":\"10.1109/IPFA.2018.8452609\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Visible Light Probing techniques are of mounting importance in improving the spatial resolution for increasingly miniaturized process technologies and demands of the sample preparation processes, precise control, and visible light metrology tools to obtain ultra-thinned samples. Current CNC contour milling processes are employed to prepare samples at $50\\\\ \\\\mu \\\\mathrm{m}$ remaining silicon thicknesses to $\\\\pm 5 \\\\mu \\\\mathrm{m}$ tolerances. In this work, a new process is proposed to significantly reduce process time and to prepare samples to tighter tolerances down to sub- $5\\\\ \\\\mu \\\\mathrm{m}$ thicknesses compatible with Visible Light Probing techniques.\",\"PeriodicalId\":382811,\"journal\":{\"name\":\"2018 IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA)\",\"volume\":\"1 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2018-07-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2018 IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IPFA.2018.8452609\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IPFA.2018.8452609","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Ultra-thin Bulk Silicon Thinning for Visible Light Probing with High Numerical Aperture Solid Immersion Lens Laser Imaging
Visible Light Probing techniques are of mounting importance in improving the spatial resolution for increasingly miniaturized process technologies and demands of the sample preparation processes, precise control, and visible light metrology tools to obtain ultra-thinned samples. Current CNC contour milling processes are employed to prepare samples at $50\ \mu \mathrm{m}$ remaining silicon thicknesses to $\pm 5 \mu \mathrm{m}$ tolerances. In this work, a new process is proposed to significantly reduce process time and to prepare samples to tighter tolerances down to sub- $5\ \mu \mathrm{m}$ thicknesses compatible with Visible Light Probing techniques.