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引用次数: 0

摘要

考虑热离子发射和肖特基势垒从源极到通道的隧穿作用,对肖特基势垒MOSFET的漏极电流进行了数学建模。漏极电流依赖于肖特基势垒高度,但几乎不受掺杂浓度的影响。对于同时具有ITO源极和漏极的耗尽型氮化镓SB MOSFET,计算得到的阈值电压为3.5 V,与实测值3.75 V相近,计算得到的漏极电流是实测值的1.2倍。
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Drain current modeling of gallium nitride schottky barrier MOSFETs
The drain current of the Schottky barrier (SB) MOSFET is modeled mathematically by considering both thermionic emissions and Schottky barrier tunneling from the source to the channel. The drain current is dependent on the Schottky barrier height, but is barely affected by the doping concentration. For the depletion type gallium nitride SB MOSFET with both an ITO source and drain electrodes, the threshold voltage is calculated to be 3.5 V, which is similar to the measured value of 3.75 V, and the calculated drain current is 1.2 times higher than the measured value.
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