改进工作区域的CMOS复合晶体管设计

Y. Yu, S. Choi, Dong-Yong Kim, KyuTae Park, H. Ahn
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引用次数: 0

摘要

提出了两种新的CMOS复合晶体管,通过降低阈值电压来改善工作区域。所提出的复合晶体管1和2分别采用p型折叠复合晶体管和电子齐纳二极管以降低阈值电压。在2.5V电源电压下,采用0.25/spl mu/m的n井工艺进行了仿真。
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Design of CMOS composite transistors with improved operating region
Proposes two new CMOS composite transistors with an improved operating region by reducing a threshold voltage. The proposed composite transistors 1 and 2 employ a p-type folded composite transistor and an electronic Zener diode in order to decrease the threshold voltage, respectively. The simulation has been carried out using 0.25/spl mu/m n-well process with 2.5V supply voltage.
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