二氧化钒神经元模拟装置的振荡速度有多快?限制二氧化钒振荡频率的物理机制

S. Carapezzi, Andrew Plews, G. Boschetto, A. Nejim, S. Karg, A. Todri-Sanial
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引用次数: 0

摘要

二氧化钒(VO2)振荡器的频率是实现称为振荡神经网络(ONNs)的神经形态电路的基本优点,因为振荡器的高频率确保了低功耗,实时计算ONNs。在这项研究中,我们对一个VO2弛豫振荡器进行了电热三维技术计算机辅助设计(TCAD)模拟。我们发现它的工作频率存在一个上限,而这个上限不能从VO2振荡器的纯电路模型中预测出来。我们研究了产生这个上限的内在物理机制。我们的TCAD模拟表明,在振荡期间,与绝缘体到金属的转变(IMT)和金属到绝缘体的转变(MIT)相对应的VO2器件上曲线电流对电压的点的频率低于ext的一些阈值,这取决于曲线电流对电压的频率。这意味着给定的载荷线在低频范围内可以满足自振荡状态的条件,但在高频范围内不再满足,从而抑制振荡。我们注意到,这种IMT/MIT点低于某些阈值的变化是由于不同因素的组合:VO2通道可实现的中间电阻状态以及频率和传热率之间的相互作用。虽然我们提取的频率上限与我们模拟的特定VO2器件有关,但我们的发现定性地适用于任何VO2振荡器。总的来说,我们的研究阐明了VO2器件中电行为和热行为之间的联系,这对任何VO2振荡器的工作频率的上限设置了限制。
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How fast can vanadium dioxide neuron-mimicking devices oscillate? Physical mechanisms limiting the frequency of vanadium dioxide oscillators
The frequency of vanadium dioxide (VO2) oscillators is a fundamental figure of merit for the realization of neuromorphic circuits called oscillatory neural networks (ONNs) since the high frequency of oscillators ensures low-power consuming, real-time computing ONNs. In this study, we perform electrothermal 3D technology computer-aided design (TCAD) simulations of a VO2 relaxation oscillator. We find that there exists an upper limit to its operating frequency, where such a limit is not predicted from a purely circuital model of the VO2 oscillator. We investigate the intrinsic physical mechanisms that give rise to this upper limit. Our TCAD simulations show that it arises a dependence on the frequency of the points of the curve current versus voltage across the VO2 device corresponding to the insulator-to-metal transition (IMT) and metal-to-insulator transition (MIT) during oscillation, below some threshold values of Cext . This implies that the condition for the self-oscillatory regime may be satisfied by a given load-line in the low-frequency range but no longer at higher frequencies, with consequent suppression of oscillations. We note that this variation of the IMT/MIT points below some threshold values of Cext is due to a combination of different factors: intermediate resistive states achievable by VO2 channel and the interplay between frequency and heat transfer rate. Although the upper limit on the frequency that we extract is linked to the specific VO2 device we simulate, our findings apply qualitatively to any VO2 oscillator. Overall, our study elucidates the link between electrical and thermal behavior in VO2 devices that sets a constraint on the upper values of the operating frequency of any VO2 oscillator.
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