{"title":"超短脉冲放电等离子体的结构","authors":"A. Mizuno, K. Okazaki, T. Takekoshi, R. Tobe","doi":"10.1109/IAS.1991.178315","DOIUrl":null,"url":null,"abstract":"The structure of pulsed discharge plasma of CH/sub 4/ mixed with H/sub 2/ and AR gases has been studied for active control of plasma CVD processing. Using square wave pulsed high voltages of 50-1000 ns width, voltage-current characteristics, time lags of current rise from that of voltage, and emission intensity profiles of the plasma have been investigated. Very high voltages up to several kilovolts can be successfully applied without any plasma nonuniformity on the electrode surface because the pulsed voltage drops before transition to arc discharge. during the pulsed period, very large current of more than 10/sup 3/ that of DC plasma can be established.<<ETX>>","PeriodicalId":294244,"journal":{"name":"Conference Record of the 1991 IEEE Industry Applications Society Annual Meeting","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1991-09-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Structure of ultra-short pulsed discharge plasma\",\"authors\":\"A. Mizuno, K. Okazaki, T. Takekoshi, R. Tobe\",\"doi\":\"10.1109/IAS.1991.178315\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The structure of pulsed discharge plasma of CH/sub 4/ mixed with H/sub 2/ and AR gases has been studied for active control of plasma CVD processing. Using square wave pulsed high voltages of 50-1000 ns width, voltage-current characteristics, time lags of current rise from that of voltage, and emission intensity profiles of the plasma have been investigated. Very high voltages up to several kilovolts can be successfully applied without any plasma nonuniformity on the electrode surface because the pulsed voltage drops before transition to arc discharge. during the pulsed period, very large current of more than 10/sup 3/ that of DC plasma can be established.<<ETX>>\",\"PeriodicalId\":294244,\"journal\":{\"name\":\"Conference Record of the 1991 IEEE Industry Applications Society Annual Meeting\",\"volume\":\"1 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1991-09-28\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Conference Record of the 1991 IEEE Industry Applications Society Annual Meeting\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IAS.1991.178315\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Conference Record of the 1991 IEEE Industry Applications Society Annual Meeting","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IAS.1991.178315","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
The structure of pulsed discharge plasma of CH/sub 4/ mixed with H/sub 2/ and AR gases has been studied for active control of plasma CVD processing. Using square wave pulsed high voltages of 50-1000 ns width, voltage-current characteristics, time lags of current rise from that of voltage, and emission intensity profiles of the plasma have been investigated. Very high voltages up to several kilovolts can be successfully applied without any plasma nonuniformity on the electrode surface because the pulsed voltage drops before transition to arc discharge. during the pulsed period, very large current of more than 10/sup 3/ that of DC plasma can be established.<>
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