3D ReRAM阵列和横梁:制造,表征和应用

G. Adam, Bhaswar Chrakrabarti, H. Nili, B. Hoskins, M. Lastras-Montaño, A. Madhavan, M. Payvand, A. Ghofrani, K. Cheng, L. Theogarajan, D. Strukov
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引用次数: 8

摘要

随着忆阻器技术的快速发展,为了最大限度地利用垂直空间并达到高通量应用所需的密度,需要这些交叉条的多层堆叠。这项工作总结了我们在设计和构建三维单片集成记忆阵列和交叉栅方面的努力,无论是独立的还是在CMOS芯片上的。我们讨论了独立和CMOS集成ReRAM阵列和横杆的制造和电气特性细节,以及它们在数字和模拟应用(如三维有状态逻辑,硬件安全原语和点积操作)的实验演示中的使用。
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3D ReRAM arrays and crossbars: Fabrication, characterization and applications
As the rapid progress of memristor technology continues, multi-layer stacking of these crossbars is needed in order to maximize the use of vertical space and achieve the required density for high throughput applications. This work summarizes our efforts of designing and building three-dimensional monolithically integrated memristive arrays and crossbars, both standalone and onto CMOS chips. We discuss the fabrication and electrical characterization details of stand-alone and CMOS integrated ReRAM arrays and crossbars together with their use in experimental demonstrations of digital and analog applications such as three-dimensional stateful logic, hardware security primitives and dot-product operations.
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