基于130纳米SiGe技术的宽带Balun-LNA

K. Murasov, S. Zavyalov, A. Kosykh, Z. B. Sadykov
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引用次数: 2

摘要

提出了一种采用130 nm SiGe BiCMOS技术设计的balun-LNA电路。采用基于异质结双极晶体管(HBT)的共基极(CB)和共发射极(CE)级设计了balun-LNA。平衡- lna电路用于射频(RF)输入信号的放大和双平衡混频器(DBM)的差分输出信号。在0.8 ~ 18 GHz频段对balun-LNA进行建模的结果如下:增益大于14 dB;NF优于5.0 dB,差分输出信号相位误差不大于27度;驻波比优于1.7;所需的面积大小为$1.73 \乘以0.73\ \mathbf{mm}^{2}$。
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The Wideband Balun-LNA in 130 nm SiGe Technology
A circuit of balun-LNA designed in 130 nm SiGe BiCMOS technology is presented. The balun-LNA has been designed using common base (CB) and common emitter (CE) stages based on heterojunction bipolar transistor (HBT). The balun-LNA circuit are used for amplification of radio frequency (RF) input signal and creation differential output signals using for double-balanced mixer (DBM). The obtained results of modeling of balun-LNA over 0.8-18 GHz frequency band are as follow: gain is more than 14 dB; NF is better than 5.0 dB, phase error of differential output signal is no more than 27 degree; VSWR is better than 1.7; required area size is $1.73 \times 0.73\ \mathbf{mm}^{2}$.
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