射频与毫米波微电子技术的现状与展望

F. Svelto
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引用次数: 0

摘要

在纳米CMOS技术中,由于通道长度短,会产生一些影响。其中最重要的是速度饱和和栅漏电流。因此,需要不同的晶体管模型来准确预测模拟电路的性能。跨导和速度都受到速度饱和的限制。此外,由于使用了更薄的栅极氧化物,噪声和失配受到更小的沟道长度的影响。此外,电源电压已经降低到1伏特左右,这给模拟电路设计带来了新的挑战。
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State of the art and perspectives in RF and mm-wave microelectronics
In nanometer CMOS technologies, several effects emerge due to short channel-lengths. Some of the most important ones are velocity saturation and gate leakage currents. As a result different transistor models are required to allow accurate prediction of analog circuit performance. The transconductance and speed are both limited by velocity saturation. Also noise and mismatch suffer from smaller channel lengths, as a result of the thinner gate oxides used. Moreover the supply voltage has been reduced to values around 1 Volt, creating new challenges for analog circuit design.
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