单点进给感应电压加法器进给方位均匀性的影响因素

Hao Wei, A. Qiu, Jiahui Yin, F. Sun, J. Zeng, Yixiang Hu
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引用次数: 1

摘要

在磁绝缘感应电压加法器(MIVA)中,实现方位均匀进给对感应电池具有重要意义。胞孔周围馈电电流的方位均匀性受到多种因素的影响。本文模拟分析了内杆加法器阻抗、多级MIVA系统的单元位置、并联驱动脉冲间隔时间等因素对馈电均匀性的影响。选择单点进给MIVA版本作为分析的基础。建立了单单元和加法器的无粒子特征三维全电磁模型。仿真结果表明,随着内杆加法阻抗和负载阻抗的增大,方位均匀性略有改善,即较高的MITL阻抗有利于电流的均匀化。模拟结果还表明,第一个小区内的非均匀性比下游其他小区稍差,但小区位置的影响可以忽略不计。单点馈电MIVA系统的驱动脉冲间隔时间几乎不影响馈电电流的分布趋势和方位均匀性,但会严重改变馈电电流和电池输出电压的波形和数值。
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Influence factors on the azimuthally uniform feed in single-point feed induction voltage adder
Achieving an azimuthally uniform feed is of greatly significance for induction cells in magnetically insulated induction voltage adder (MIVA). The azimuthal uniformity of feed currents around cell bores is affected by various factors. In this paper, the effects of several factors, such as adder impedances of the inner stalk, cell locations in multi-stage MIVA systems, and time spreads between parallel driving pulses, on the feed uniformity are simulated and analyzed. The single-point feed MIVA version is chosen as the basis of analysis. A 3D fully electromagnetic model without particle features is developed for a single cell and an adder with three cells in series, respectively. Simulation results demonstrate that, as adder impedances of the inner stalk and load impedances increase, the azimuthal uniformity is improved slightly, i.e., a higher MITL impedance is a bit helpful for current symmetrization. Simulation results also indicate that, the non-uniformity within the first cell is little worse than other cells downstream, however, the effects of cell locations could be negligible. The time spreads between driving pulses for single-point feed MIVA systems nearly not affect the distribution tendency and azimuthal uniformity of feed currents, while badly changing the waveforms and the numerical values of feed currents and cell output voltage.
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