有源区长度和厚度对InP/InGaAsP激光器辐射输出功率的影响

A. Prajapati, P. Dey, Jivesh Verma, T. Das
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引用次数: 1

摘要

采用两种不同的半导体材料,设计了一种双异质结构受激辐射放大装置。用于活性区的材料是InGaAsP,与充当体的InP几乎是晶格匹配的。我们设计该装置是为了观察有源区长度和厚度对辐射输出功率、光子密度的影响,以及有源区辐射方向图随有源区长度和厚度变化的变化。随着厚度的减小,可以观察到合适的八角形相干单色辐射图,但随着活动区域长度的变化,辐射图似乎受到干扰。当阳极电压为1.7V时,法布里-珀罗激光器在波长为1.21µm处的最大光强为2.72×108。在这方面,我们研究了反射率随活跃区长度的变化。
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Impact of length and thickness of active region on radiated output power of InP/InGaAsP laser
A double heterostructure light amplification by stimulated emission of radiation device is designed from two different semiconductor materials. The material used for the active region is InGaAsP and is nearly lattice matched with InP acting as the bulk. We have designed the device in order to observe the impact of length and thickness of active region on radiated output power, photon density and the changes in the radiation pattern of the active region with the variation of length and thickness of the active region. A proper octagonal coherent monochromatic radiation pattern is observed as we reduce the thickness but with the variation of length of the active region, the radiation pattern seems to get disturbed. For the anode voltage of 1.7V, the maximum light intensity achieved from the Fabry-Perot laser is 2.72×108 and is obtained at a wavelength of 1.21µm. In this regard we have studied the variation of reflectivity as function of length of the active region.
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