{"title":"半导体精益生产的探索:新工艺的引入","authors":"D. Mowery, N. Hatch, M. Borrus, A. Shuen","doi":"10.1109/IEMT.1993.398157","DOIUrl":null,"url":null,"abstract":"Some preliminary results of research on new process introduction in semiconductors are presented. Data and present descriptive data on trends in manufacturing improvement drawn from the authors' current sample are discussed. The qualitative evidence on interfirm differences in management and performance in new process introduction is reviewed. An exploratory empirical model of new process introduction and manufacturing improvement is presented. Results are summarized and some directions for further research are suggested.<<ETX>>","PeriodicalId":206206,"journal":{"name":"Proceedings of 15th IEEE/CHMT International Electronic Manufacturing Technology Symposium","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1993-10-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Searching for lean production in semiconductors: New process introduction\",\"authors\":\"D. Mowery, N. Hatch, M. Borrus, A. Shuen\",\"doi\":\"10.1109/IEMT.1993.398157\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Some preliminary results of research on new process introduction in semiconductors are presented. Data and present descriptive data on trends in manufacturing improvement drawn from the authors' current sample are discussed. The qualitative evidence on interfirm differences in management and performance in new process introduction is reviewed. An exploratory empirical model of new process introduction and manufacturing improvement is presented. Results are summarized and some directions for further research are suggested.<<ETX>>\",\"PeriodicalId\":206206,\"journal\":{\"name\":\"Proceedings of 15th IEEE/CHMT International Electronic Manufacturing Technology Symposium\",\"volume\":\"1 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1993-10-04\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings of 15th IEEE/CHMT International Electronic Manufacturing Technology Symposium\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IEMT.1993.398157\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of 15th IEEE/CHMT International Electronic Manufacturing Technology Symposium","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEMT.1993.398157","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Searching for lean production in semiconductors: New process introduction
Some preliminary results of research on new process introduction in semiconductors are presented. Data and present descriptive data on trends in manufacturing improvement drawn from the authors' current sample are discussed. The qualitative evidence on interfirm differences in management and performance in new process introduction is reviewed. An exploratory empirical model of new process introduction and manufacturing improvement is presented. Results are summarized and some directions for further research are suggested.<>