半导体精益生产的探索:新工艺的引入

D. Mowery, N. Hatch, M. Borrus, A. Shuen
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引用次数: 2

摘要

介绍了半导体新工艺引进的一些初步研究结果。从作者目前的样本中得出的数据和目前的制造改进趋势的描述性数据进行了讨论。本文回顾了新工艺引入过程中企业间管理和绩效差异的定性证据。提出了新工艺引进与制造改进的探索性实证模型。对研究结果进行了总结,并提出了进一步研究的方向。
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Searching for lean production in semiconductors: New process introduction
Some preliminary results of research on new process introduction in semiconductors are presented. Data and present descriptive data on trends in manufacturing improvement drawn from the authors' current sample are discussed. The qualitative evidence on interfirm differences in management and performance in new process introduction is reviewed. An exploratory empirical model of new process introduction and manufacturing improvement is presented. Results are summarized and some directions for further research are suggested.<>
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