Pinal Rana, D. P. Khatri, A. Kottantharayil, D. Marla
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The experimental results suggest that the SiN x layer starts to ablate only above a threshold laser fluence of 1.4 J/cm2, while the surface bulged out for laser fluence slightly below the ablation threshold. The central part of the ablated region was clean with a negligible nitrogen concentration at the surface, about ∼0.03% at a fluence of 2.4 J/cm2. Nitrogen concentration reduces continuously and almost becomes zero at 80 nm depth, suggesting complete ablation of the SiN x layer for establishing electrical contacts. The ablation width was close to the laser spot diameter only at lower values of the laser fluence. The lowest value of ablation depth was about 180 nm, suggesting that only about 95 nm layer of the silicon is ablated. The study demonstrates that nanosecond laser ablation is a potential technique for ablation of the SiN x layer of PERC solar cells but requires choosing the optimal parameters.","PeriodicalId":129806,"journal":{"name":"Journal of Micromanufacturing","volume":"112 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2022-11-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"An experimental study on laser ablation of Ultra-thin SiN x layer of PERC solar cell\",\"authors\":\"Pinal Rana, D. P. Khatri, A. Kottantharayil, D. Marla\",\"doi\":\"10.1177/25165984221129958\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this work, a nanosecond green laser (532 nm) is used to generate narrow openings by removing an ultra-thin (85 nm) SiN x layer that is coated on a silicon substrate for application in the fabrication of Passivated Emitter and Rear Contact (PERC) solar cells. An experimental analysis is presented to identify the optimal range of laser parameters for an efficient ablation with minimal damage to the silicon substrate. The ablated samples were characterized using a 3D profilometer to obtain the surface profiles and scanning electron microscope imaging to observe the surface quality. Further, energy-dispersive X-ray line analysis and atom probe tomography were performed to evaluate the nitrogen content on the surface and along the depth, respectively. The experimental results suggest that the SiN x layer starts to ablate only above a threshold laser fluence of 1.4 J/cm2, while the surface bulged out for laser fluence slightly below the ablation threshold. The central part of the ablated region was clean with a negligible nitrogen concentration at the surface, about ∼0.03% at a fluence of 2.4 J/cm2. Nitrogen concentration reduces continuously and almost becomes zero at 80 nm depth, suggesting complete ablation of the SiN x layer for establishing electrical contacts. The ablation width was close to the laser spot diameter only at lower values of the laser fluence. The lowest value of ablation depth was about 180 nm, suggesting that only about 95 nm layer of the silicon is ablated. 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引用次数: 1
摘要
在这项工作中,使用纳秒绿色激光(532 nm)去除涂在硅衬底上的超薄(85 nm) SiN x层来产生狭窄的开口,该层用于制造钝化发射极和后接触(PERC)太阳能电池。通过实验分析,确定了在对硅衬底损伤最小的情况下进行有效烧蚀的最佳激光参数范围。利用三维轮廓仪对烧蚀后的样品进行了表征,获得了表面轮廓,并用扫描电镜成像观察了表面质量。此外,利用能量色散x射线线分析和原子探针层析成像分别评估了表面和深度上的氮含量。实验结果表明,当激光辐照强度为1.4 J/cm2时,sinx层才开始烧蚀,而当激光辐照强度略低于烧蚀阈值时,表面会凸出。烧蚀区域的中心部分是干净的,表面的氮浓度可以忽略不计,在2.4 J/cm2的影响下,约为0.03%。氮浓度持续下降,在80nm深度时几乎为零,表明为了建立电接触,sinx层已经完全烧蚀。只有在较低的激光通量下,烧蚀宽度才接近光斑直径。烧蚀深度最小值约为180 nm,表明仅烧蚀了约95 nm的硅层。研究表明,纳秒激光烧蚀是一种有潜力的烧蚀PERC太阳能电池sinx层的技术,但需要选择最佳参数。
An experimental study on laser ablation of Ultra-thin SiN x layer of PERC solar cell
In this work, a nanosecond green laser (532 nm) is used to generate narrow openings by removing an ultra-thin (85 nm) SiN x layer that is coated on a silicon substrate for application in the fabrication of Passivated Emitter and Rear Contact (PERC) solar cells. An experimental analysis is presented to identify the optimal range of laser parameters for an efficient ablation with minimal damage to the silicon substrate. The ablated samples were characterized using a 3D profilometer to obtain the surface profiles and scanning electron microscope imaging to observe the surface quality. Further, energy-dispersive X-ray line analysis and atom probe tomography were performed to evaluate the nitrogen content on the surface and along the depth, respectively. The experimental results suggest that the SiN x layer starts to ablate only above a threshold laser fluence of 1.4 J/cm2, while the surface bulged out for laser fluence slightly below the ablation threshold. The central part of the ablated region was clean with a negligible nitrogen concentration at the surface, about ∼0.03% at a fluence of 2.4 J/cm2. Nitrogen concentration reduces continuously and almost becomes zero at 80 nm depth, suggesting complete ablation of the SiN x layer for establishing electrical contacts. The ablation width was close to the laser spot diameter only at lower values of the laser fluence. The lowest value of ablation depth was about 180 nm, suggesting that only about 95 nm layer of the silicon is ablated. The study demonstrates that nanosecond laser ablation is a potential technique for ablation of the SiN x layer of PERC solar cells but requires choosing the optimal parameters.