采用双栅极技术的低插入损耗和高功率处理能力的Sub-6 GHz GaAs pHEMT SPDT开关

J. Kwon, Jinho Yoo, Jaeyong Lee, Tae-Hoo Kim, Changkun Park
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引用次数: 1

摘要

提出了一种采用0.5 μm GaAs pHEMT工艺制作的sub-6 GHz双栅单极双掷(SPDT)开关。所有端口都由单个电感匹配,在3-5 GHz的工作频率范围内实现低插入损耗和高隔离。采用双栅极技术和off状态电压优化,在提高线性度的同时降低了插入损耗。在3-5 GHz测量的输入和输出回波损耗为> - 15 dB。插入损耗< 0.3 dB, 3-5 GHz隔离度为> 32.7 dB。在3ghz时,输入1db压缩点(IP1dB)的测量结果高于34.2 dBm。该SPDT开关的芯片面积(包括焊盘)为0.97 × 0.86 mm2。
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Sub-6 GHz GaAs pHEMT SPDT Switch with Low Insertion Loss and High Power Handling Capability Using Dual-Gate Technique
This paper presents a sub-6 GHz dual-gate single-pole double-throw (SPDT) switch fabricated in a 0.5 μm GaAs pHEMT technology. All ports are matched by a single inductor which allows to achieve low insertion loss and high isolation in the operating frequency range of 3–5 GHz. Dual-gate technique and OFF-state voltage optimization were used to enhance linearity while reducing the insertion loss. The input and output return losses measured at 3–5 GHz were > 15 dB. The insertion loss was measured < 0.3 dB and isolation was > 32.7 dB at 3–5 GHz. At 3 GHz, the measurement result of the input 1-dB compression point (IP1dB) was higher than 34.2 dBm. The chip area of the proposed SPDT switch, including pads, is 0.97 × 0.86 mm2.
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