H. Kinoshita, K. Kurihara, T. Mizota, T. Haga, Y. Torii
{"title":"使用反射掩模的软x射线还原光刻","authors":"H. Kinoshita, K. Kurihara, T. Mizota, T. Haga, Y. Torii","doi":"10.1364/sxray.1991.wd2","DOIUrl":null,"url":null,"abstract":"We have conducted the research work on X-ray projection lithography and have already demonstrated a 0.5 µm replicated pattern using a reflection mask. To obtain smaller features, we have designed a Schwarzschild typed demagnifying objective with a numerical aperture size of 0.1 and fabricated a Mo/B4C multilayer very precisely on its optics.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"17 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1992-05-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"6","resultStr":"{\"title\":\"Soft X-ray reduction lithography using a reflection mask\",\"authors\":\"H. Kinoshita, K. Kurihara, T. Mizota, T. Haga, Y. Torii\",\"doi\":\"10.1364/sxray.1991.wd2\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We have conducted the research work on X-ray projection lithography and have already demonstrated a 0.5 µm replicated pattern using a reflection mask. To obtain smaller features, we have designed a Schwarzschild typed demagnifying objective with a numerical aperture size of 0.1 and fabricated a Mo/B4C multilayer very precisely on its optics.\",\"PeriodicalId\":409291,\"journal\":{\"name\":\"Soft-X-Ray Projection Lithography\",\"volume\":\"17 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1992-05-22\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"6\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Soft-X-Ray Projection Lithography\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1364/sxray.1991.wd2\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Soft-X-Ray Projection Lithography","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/sxray.1991.wd2","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Soft X-ray reduction lithography using a reflection mask
We have conducted the research work on X-ray projection lithography and have already demonstrated a 0.5 µm replicated pattern using a reflection mask. To obtain smaller features, we have designed a Schwarzschild typed demagnifying objective with a numerical aperture size of 0.1 and fabricated a Mo/B4C multilayer very precisely on its optics.
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