基于0.15 μm GaN技术的28 GHz功率放大器设计

Jakov Mihaljevic, S. Chakraborty, Leigh E. Milner, S. Mahon, M. Heimlich
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摘要

本文介绍了两个单级功率放大器(PAs)的设计和仿真,以确定WIN半导体0.15 μm氮化镓(GaN)- sic工艺的性能。随后,提出了一种28 GHz两级PA,用于集成到5G收发器应用中。使用2×100门宽器件开发驱动级PA (MMIC1),在所需的28 GHz下产生模拟的12.8 dB小信号增益。使用4×100门宽器件来表征输出级PA (MMIC2),输出功率为33 dBm, PAE为41%,功率增益为11.2 dB。随后设计的两级扩音器MMIC3结合了MMIC1和MMIC2,提供了22.5 dB的峰值小信号增益,33 dBm的峰值输出功率,31%的峰值PAE和22.4 dB的峰值功率增益。
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Design of a 28 GHz Power Amplifier in 0.15 μm GaN Technology
This paper presents the design and simulation of two single-stage power amplifiers (PAs) to determine the performance capabilities of WIN Semiconductors 0.15 μm Gallium Nitride (GaN)-on-SiC process. Subsequently a 28 GHz two-stage PA is presented for potential integration into 5G transceiver applications. A 2×100 gate-width device was used to develop a driving stage PA (MMIC1) which produced a simulated 12.8 dB small signal gain at the desired 28 GHz. A 4×100 gate-width device was used to characterize an output stage PA (MMIC2) producing 33 dBm power out, PAE of 41%, and a power gain of 11.2 dB. The subsequently designed two-stage PA, MMIC3, combines MMIC1 and MMIC2 and provides a peak small signal gain of 22.5 dB, peak power output of 33 dBm, peak PAE of 31% and peak power gain of 22.4 dB.
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