基于inse的场效应晶体管的电特性

Tsung-Pin Lu, Ming-Xian Loi, Ji-Jhih Yeh, Ambika Subramanian, Pin-Hsi Chiu, Cheng-Han Wu, Hao-Wei Liu, R. Ulaganathan, Chang‐Yu Lin
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引用次数: 0

摘要

了解和优化二维(2D)范德华材料的电学性质至关重要,因为材料的厚度可以极大地影响基于二维材料的电子器件和其他应用领域。本研究的主要目的是研究检验场效应管性能的最重要参数,载流子迁移率(µ)和基于硒化铟(InSe)的场效应晶体管的阈值电压(Vth)。我们认为,分析二维材料的厚度对于提高fet在各种电子和光电子应用中的性能至关重要。我们希望这一结果可以帮助互补金属氧化物半导体(CMOS)逆变器和逻辑电路应用的性能提高。
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Electrical Characteristics of InSe-based Field-effect Transistors
To understand and optimize the eletrical properties of two-dimensional (2D) Van der Waals material is crucial since the thickness of the material can substantially affect the field of 2D material based eletronic devices and other applications. The main objective of this study is to investigate the most important parameters for examing the performance of FETs, carrier mobility (µ) and threshold voltage (Vth) of indium selenide (InSe) based field-effect transistor. We believe that analyzing the thickness of 2D materials is essential for the performance enhancement of FETs in a variety of electronic and optoelectronic applications. We hope this result can be assisted in performance enhancement of complementary metal-oxide-semiconductor (CMOS) inverter and logic circuit applications.
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