Ku波段金属通孔互连带状线电容过渡的非标准PCB通孔设置使用顺序堆积技术

V. Almeida, Matheus P Santana, Eric Valter Saconi Barbosa, S. Rondineau
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引用次数: 0

摘要

本文提出了一种多路径金属通孔通过互连带状线过渡,作为多层PCB设计中通孔设置定义的印刷电路板(PCB)技术限制的解决方案。该结构在Ku波段工作,在制造商的能力范围内对层错位具有很强的鲁棒性,使其成为低成本工业生产的可靠解决方案。路径和均匀损耗之间的低相位延迟差异使得它可以用于真正的时间延迟波束形成应用,例如基于罗特曼透镜的无源相控阵。
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Ku Band Metallic Via Through Interconnect–Stripline Capacitive Transitions for Non-Standard PCB Via Setup Using Sequential Build-Up Technology
This manuscript proposes a multi-path metallic via through interconnect stripline transition as a Printed Circuit Board (PCB) technology limitations work-around for via setup definition in multi-layer PCB design. The structure operates at the Ku band and presents a strong robustness to layer misalignment within the capabilities of the manufacturers, turning it in a reliable solution for low cost industrial production. The low phase delay differences between paths and homogeneous loss makes it possible for use on true-time-delay beamforming applications, such as passive phased arrays based on Rotman Lenses.
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