硫化镉的m.i.s装置表面态

M. Manshadi, J. Woods
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引用次数: 0

摘要

通过将金沉积到先前在盐酸中蚀刻的晶体表面而形成的硫化镉的m.i.s二极管的分流电导的测量,被解释为表明在CdS和半绝缘层之间的界面处存在着2.0 X 1011 cm-2 eV-1的表面态密度。C-2/V图的电压截距与光电阈值的比较表明,刻蚀后的半绝缘层厚度为400?cd表面的电流为600a。
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Surface states in m.i.s. devices of cadmium sulphide
Measurements of the shunt conductance of m.i.s. diodes of cadmium sulphide, formed by depositing gold on to surfaces of crystals previously etched in hydrochloric acid, are interpreted to suggest that there is a density of surface states of the order of 2.0 X 1011 cm-2 eV-1 at the interface between the CdS and the semi-insulating layer. Comparison of the voltage intercept of the C-2/V plots with the photoelectric threshold suggests that the etching leaves a semi-insulating layer with a thickness of 400?600 A on the surface of the CdS.
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