一种新的MOS器件片上辐照后退火集成测试结构

C. Chabrerie, J. Autran, O. Flament, J. Boudenot
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引用次数: 0

摘要

我们已经开发了一个原型测试结构(名为THERMOS),展示了在硅绝缘体上芯片加热技术的可行性和兴趣。该电路是专门为研究辐射硬化CMOS技术中的辐照后效应而设计的。本文给出了辐照n沟道晶体管片上退火的初步结果。
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A new integrated test structure for on-chip post-irradiation annealing in MOS devices
We have developed a prototype test structure (named THERMOS) demonstrating the feasibility and the interest of the on-chip heating in a Silicon-On-Insulator technology. This circuit has been specially designed for the study of post-irradiation effects in a radiation-hardened CMOS technology. Preliminary results are presented here for the on-chip annealing of irradiated n-channel transistors.
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