{"title":"GQFN 64L器件集成电路制造过程中的EOS/ESD","authors":"Bernard Chin, L. H. Koh","doi":"10.23919/EOS/ESD.2018.8509770","DOIUrl":null,"url":null,"abstract":"This paper presents a case study of ESD/EOS events causing low yield in trial lots prior to the release of volume production. The use of line ESD audits to check for static charge, grounding and CDM events, voltage spike check and split-lot testing were used to determine the root cause.","PeriodicalId":328499,"journal":{"name":"2018 40th Electrical Overstress/Electrostatic Discharge Symposium (EOS/ESD)","volume":"46 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2018-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"EOS/ESD in IC Manufacturing Process of GQFN 64L Devices\",\"authors\":\"Bernard Chin, L. H. Koh\",\"doi\":\"10.23919/EOS/ESD.2018.8509770\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper presents a case study of ESD/EOS events causing low yield in trial lots prior to the release of volume production. The use of line ESD audits to check for static charge, grounding and CDM events, voltage spike check and split-lot testing were used to determine the root cause.\",\"PeriodicalId\":328499,\"journal\":{\"name\":\"2018 40th Electrical Overstress/Electrostatic Discharge Symposium (EOS/ESD)\",\"volume\":\"46 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2018-09-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2018 40th Electrical Overstress/Electrostatic Discharge Symposium (EOS/ESD)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.23919/EOS/ESD.2018.8509770\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 40th Electrical Overstress/Electrostatic Discharge Symposium (EOS/ESD)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.23919/EOS/ESD.2018.8509770","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
EOS/ESD in IC Manufacturing Process of GQFN 64L Devices
This paper presents a case study of ESD/EOS events causing low yield in trial lots prior to the release of volume production. The use of line ESD audits to check for static charge, grounding and CDM events, voltage spike check and split-lot testing were used to determine the root cause.
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