DARPA多样化可及异构集成(DAHI)项目:化合物半导体器件和硅使能架构的融合

S. Raman, C. L. Dohrman, Tsu-Hsi Chang
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引用次数: 9

摘要

DARPA多样化可及异构集成(DAHI)项目正在开发晶体管规模的异构集成工艺,将先进的化合物半导体(CS)器件以及其他新兴材料和器件与高密度硅CMOS技术紧密结合。该技术目前使射频/混合信号电路具有革命性的性能。例如,InP HBT + CMOS技术正用于先进的dac和adc,具有CMOS校准和自我修复技术,用于原位校正静态和动态误差。这种基于cmos的自修复技术有望在工艺和环境变化以及老化的情况下,更普遍地提高基于cs的电路性能和良率。DAHI还有望实现高功率CS器件与硅基线性化技术的集成,以实现高功率高效发射机。通过实现这种异构集成能力,DAHI寻求为微系统设计人员在通用硅基平台上利用各种材料和器件技术建立一个新的范例。
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The DARPA Diverse Accessible Heterogeneous Integration (DAHI) program: Convergence of compound semiconductor devices and silicon-enabled architectures
The DARPA Diverse Accessible Heterogeneous Integration (DAHI) program is developing transistor-scale heterogeneous integration processes to intimately combine advanced compound semiconductor (CS) devices, as well as other emerging materials and devices, with high-density silicon CMOS technology. This technology is currently enabling RF/mixed signal circuits with revolutionary performance. For example, InP HBT + CMOS technology is being utilized in advanced DACs and ADCs with CMOS-enabled calibration and self-healing techniques for correcting static and dynamic errors in situ. Such CMOS-enabled self-healing techniques are expected to more generally enable improved CS-based circuit performance and yield in the presence of process and environmental variability, as well as aging. DAHI is also expected to enable the integration of high power CS devices with silicon-based linearization techniques to realize highly power efficient transmitters. By enabling this heterogeneous integration capability, DAHI seeks to establish a new paradigm for microsystems designers to utilize a diverse array of materials and device technologies on a common silicon-based platform.
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