Research on metasurface holographic imaging based on nanoimprint lithography

Metasurface is a kind of functional device based on assemblies of subwavelength structures, which can perform multiple operations on light modulation, such as phase, amplitude and polarization modulation. However, due to the difficulty of design and high processing cost of three-dimensional nano-structure, it is far from practical applications. In this paper, we propose a method to replicate the metasurface structure at room temperature using Nanoimprint Lithography (NIL), the process including: use electron beam lithography to fabricate metasurface structure as the master for NIL; transfer the inverse structure of metasurface onto the PET substrate as the working NIL stamp; imprint the metasurface structure into proper UV resist as the metasurface holographic substrate. The imprinted metasurface structure was characterized by SEM, and the image information recorded inside the metasurface structure was reproduced by laser illumination, which proved the effectiveness of the proposed method.