{"title":"超大规模集成电路的扩展趋势和挑战","authors":"S. Rusu","doi":"10.1109/TUTCAS.2001.946980","DOIUrl":null,"url":null,"abstract":"This article discusses trends in VLSI technology evolution. It concentrates on challenges to VLSI scaling, including transistor scaling, interconnect scaling, leakage currents and silicon-on-insulator technology. It concludes that we still have not found a fundamental barrier to extending Moore's law and that the major challenge to scaling in the future will be power and efficiency.","PeriodicalId":376181,"journal":{"name":"Tutorial Guide. ISCAS 2001. IEEE International Symposium on Circuits and Systems (Cat. No.01TH8573)","volume":"7 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2001-05-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"VLSI scaling trends and challenges\",\"authors\":\"S. Rusu\",\"doi\":\"10.1109/TUTCAS.2001.946980\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This article discusses trends in VLSI technology evolution. It concentrates on challenges to VLSI scaling, including transistor scaling, interconnect scaling, leakage currents and silicon-on-insulator technology. It concludes that we still have not found a fundamental barrier to extending Moore's law and that the major challenge to scaling in the future will be power and efficiency.\",\"PeriodicalId\":376181,\"journal\":{\"name\":\"Tutorial Guide. ISCAS 2001. IEEE International Symposium on Circuits and Systems (Cat. No.01TH8573)\",\"volume\":\"7 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2001-05-06\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Tutorial Guide. ISCAS 2001. IEEE International Symposium on Circuits and Systems (Cat. No.01TH8573)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/TUTCAS.2001.946980\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Tutorial Guide. ISCAS 2001. IEEE International Symposium on Circuits and Systems (Cat. No.01TH8573)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/TUTCAS.2001.946980","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
This article discusses trends in VLSI technology evolution. It concentrates on challenges to VLSI scaling, including transistor scaling, interconnect scaling, leakage currents and silicon-on-insulator technology. It concludes that we still have not found a fundamental barrier to extending Moore's law and that the major challenge to scaling in the future will be power and efficiency.
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