防止SPC法对键垫表面元素浓度的螺旋钻分析误判

Sheng-Min Chen, C. Tseng, Kuan-Chieh Huang
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摘要

在半导体中,当F浓度较高时,键合焊盘表面的F原子具有较高的引起焊盘腐蚀、危及键合过程和引起可靠性问题的风险。因此,应尽量减少F原子在焊盘表面的出现。为了保证质量,氟浓度垫面测试是重要的。一般的F浓度分析采用AES分析法。然而,AES是一种半定量仪器,这意味着如果对一个样品进行多次分析,则可以观察到测试结果的波动。这种波动可能导致对数据的误判。由于机器的不稳定性和工艺的不稳定性,即使是微小的波动也会相互干扰。因此,为了有效地澄清微小的波动问题,正确的行动对晶圆制造至关重要。本文提出了一个有效判断AES数据的合适范围,并采用SPC(统计过程控制)方法对其进行跟踪。
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Prevent Auger Analysis Misjudgment on Bond Pad Surface Element Concentration in the SPC Method
In semiconductors, when the F concentration is high, the F atom on the bond pad surface has a higher risk of causing pad corrosion, jeopardizing the bonding process, and causing reliability problems. Therefore, occurrence of F atom on the pad surface should be minimized. In order to ensure the quality, F-concentration pad surface test is important. General F concentration analysis uses the AES analysis method. However, AES is a semi-quantitative instrument, which means that if one sample is analyzed multiple times, a fluctuation in test results can be observed. This fluctuation can lead to misjudgment of data. Due to machine instability and process instability, even tiny fluctuations can interfere with each other. Thus, in order to effectively clarify minor fluctuation problems, correct action is crucial for wafer manufacturing. This article proposes a suitable range to effectively judge the AES data and use the SPC (Statistical Process Control) method to track it.
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