具有溶胶-凝胶处理ZrO2层的高性能溶胶-凝胶处理SnO2薄膜晶体管

Won-Yong Lee, Bongho Jang, Sojeong Lee, Taegyun Kim, Jaewon Jang
{"title":"具有溶胶-凝胶处理ZrO2层的高性能溶胶-凝胶处理SnO2薄膜晶体管","authors":"Won-Yong Lee, Bongho Jang, Sojeong Lee, Taegyun Kim, Jaewon Jang","doi":"10.23919/AM-FPD.2018.8437365","DOIUrl":null,"url":null,"abstract":"We propose an effective process for the enhancement of electrical performance in solution-processed SnO<inf>2</inf>-based oxide thin-film transistors (TFTs) by adding a ZrO<inf>2</inf>layer on the active layer. The ZrO<inf>2</inf>layer was spin coated on the SnO<inf>2</inf>film with a single coating and double coating process under the same condition. The SnO<inf>2</inf> TFTs with double-coated ZrO<inf>2</inf> layers showed a saturation mobility of 51.2 cm<sup>2</sup>/Vs, which was more than four times higher than that of conventional SnO<inf>2</inf> TFTs. Furthermore, the subthreshold slope reduced from 1.17 V /decade to 0.36 V /decade for SnO<inf>2</inf> TFTs with double-coated ZrO<inf>2</inf> layers. These results are attributed to the electron transfer based on the theory of electron donation from high-k dielectrics to oxide semiconductors.","PeriodicalId":221271,"journal":{"name":"2018 25th International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD)","volume":"24 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2018-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":"{\"title\":\"High Performance Sol-gel Processed SnO2 thin film transistor with sol-gel processed ZrO2 layers\",\"authors\":\"Won-Yong Lee, Bongho Jang, Sojeong Lee, Taegyun Kim, Jaewon Jang\",\"doi\":\"10.23919/AM-FPD.2018.8437365\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We propose an effective process for the enhancement of electrical performance in solution-processed SnO<inf>2</inf>-based oxide thin-film transistors (TFTs) by adding a ZrO<inf>2</inf>layer on the active layer. The ZrO<inf>2</inf>layer was spin coated on the SnO<inf>2</inf>film with a single coating and double coating process under the same condition. The SnO<inf>2</inf> TFTs with double-coated ZrO<inf>2</inf> layers showed a saturation mobility of 51.2 cm<sup>2</sup>/Vs, which was more than four times higher than that of conventional SnO<inf>2</inf> TFTs. Furthermore, the subthreshold slope reduced from 1.17 V /decade to 0.36 V /decade for SnO<inf>2</inf> TFTs with double-coated ZrO<inf>2</inf> layers. These results are attributed to the electron transfer based on the theory of electron donation from high-k dielectrics to oxide semiconductors.\",\"PeriodicalId\":221271,\"journal\":{\"name\":\"2018 25th International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD)\",\"volume\":\"24 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2018-07-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"3\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2018 25th International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.23919/AM-FPD.2018.8437365\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 25th International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.23919/AM-FPD.2018.8437365","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3

摘要

我们提出了一种有效的方法,通过在有源层上添加zro2层来提高溶液处理sno2基氧化物薄膜晶体管(TFTs)的电性能。在相同的条件下,采用单涂层和双涂层两种工艺将zro2层自旋涂覆在sno2薄膜上。采用ZrO2双层涂层的SnO2 tft的饱和迁移率为51.2 cm2/Vs,是传统SnO2 tft的4倍以上。此外,对于双ZrO2涂层的SnO2 tft,亚阈值斜率从1.17 V /decade降低到0.36 V /decade。这些结果归因于基于高k介电体给电子理论的电子转移到氧化物半导体。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
High Performance Sol-gel Processed SnO2 thin film transistor with sol-gel processed ZrO2 layers
We propose an effective process for the enhancement of electrical performance in solution-processed SnO2-based oxide thin-film transistors (TFTs) by adding a ZrO2layer on the active layer. The ZrO2layer was spin coated on the SnO2film with a single coating and double coating process under the same condition. The SnO2 TFTs with double-coated ZrO2 layers showed a saturation mobility of 51.2 cm2/Vs, which was more than four times higher than that of conventional SnO2 TFTs. Furthermore, the subthreshold slope reduced from 1.17 V /decade to 0.36 V /decade for SnO2 TFTs with double-coated ZrO2 layers. These results are attributed to the electron transfer based on the theory of electron donation from high-k dielectrics to oxide semiconductors.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Development of Roll-to-Roll Multi-layer Thermal Evaporation System for Flexible OLED Devices Hydrogenated Amorphous Silicon Gate Driver with Charge-Holding Scheme for in-Cell Touch Panels Progress in the Development of Heavy Metal-Free Quantum Dots for Electroluminescent Displays Solution processed low-color temperature OLED with high efficiency Current Status of OLED Material and Process Technologies for Display and Lighting
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1