基于异步光学结构的高速擦洗

Takumi Fujimori, Minoru Watanabe
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引用次数: 0

摘要

最近,现场可编程门阵列(fpga)有望用于高辐射环境,如福岛第一核电站。根据最近报道的新闻,已确认在福岛第一核电站安全壳外有一个辐射强度为650西沃特/小时的区域。为了在这种极高辐射环境下使用,必须对fpga进行高速擦洗操作。在最近的文献报道中,提出了一种可用于光可重构门阵列的高速光擦洗方法。这种采用光学高速擦洗的光学可重构门阵列可用于强辐射环境。此外,为了提高光擦洗运算速度,本文提出了一种用于光可重构门阵列的高速光擦洗方法,该方法具有更简单的顺序。在制备的光可重构门阵列VLSI上,可以确定50 ns周期的高速擦洗操作。
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High-speed scrubbing bassed on asynchronous optical configuration
Recently, field programmable gate arrays (FPGAs) are anticipated for use in high-radiation environments such as that of the Fukushima Daiichi nuclear power plant. According to recently reported news, an area with 650 Sv/h radiation intensity has been confirmed outside of a containment vessel at the Fukushima Daiichi nuclear power plant. For uses under such extremely high radiation environments, high-speed scrubbing operations must be applied for FPGAs. A high-speed optical scrubbing method that can be used on optically reconfigurable gate arrays has been proposed in recent reports of the literature. Such optically reconfigurable gate arrays using optical high-speed scrubbing can be used in environments with intense radiation. In addition, to increase the optical scrubbing operation speed, this paper demonstrates a high-speed optical scrubbing method with a simpler sequence for use on an optically reconfigurable gate array. The 50 ns period high-speed scrubbing operation could be confirmed on the fabricated optically reconfigurable gate array VLSI.
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