不同源漏工程下MuGFET器件的模拟参数

M. Galeti, M. Rodrigues, J. Martino, N. Collaert, E. Simoen, M. Aoulaiche, C. Claeys
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引用次数: 1

摘要

这项工作表征了具有不同源极/漏极配置的SOI n- mugfet的模拟性能。没有源极/漏极扩展的器件,由于早期电压的增加,即使跨导降低,也会导致更大的固有电压增益。同时,它们显示出界面质量的退化,低频噪声更大,线性度降低。另一方面,由于垂直电场的抑制,它们可以实现降低GIDL电流。
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Analog parameters of MuGFET devices with different source/drain engineering
This work characterizes the analog performance of SOI n-MuGFETs with different source/drain configurations. Devices without source/drain extension lead to a larger intrinsic voltage gain, even with the reduced transconductance, due to the increased Early voltage. At the same time, they showed a degradation of the interface quality with a larger low-frequency noise and reduced linearity. On the other hand, they can achieve reduced GIDL current due to the suppressed vertical electric field.
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