硅锗多层薄膜热电性能图

A. Yamamoto, T. Ohta
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引用次数: 0

摘要

从理论上计算了Si、Si/sub 70/Ge/sub 30/和硅化热电材料制备的多层量子阱薄膜的电导率/spl sigma/、塞贝克系数/spl alpha/、导热系数/spl kappa/和品质系数ZT (Z=/spl sigma/ /spl alpha//sup 2///spl kappa/)。对这些材料应用了二维单带半导体输运模型。计算结果表明,量子阱的载流子约束主要影响载流子能量的增加和功率因数/spl σ // spl α //sup 2/的最优点移位。在300 K时,调制掺杂Si/sub 70/Ge/sub 30/ QWs的优值与块体材料的优值相同。与Si/sub 70/Ge/sub 30/ QWs相比,掺杂硅化物调制的QWs具有更大的优值。
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Thermoelectric figure of merit of Si-Ge multilayered thin films
The electrical conductivity /spl sigma/, the Seebeck coefficient /spl alpha/, the thermal conductivity /spl kappa/ and the figure of merit ZT (Z=/spl sigma/ /spl alpha//sup 2///spl kappa/) were calculated theoretically for multilayered thin film with quantum wells (QWs) made of Si, Si/sub 70/Ge/sub 30/ and silicide thermoelectric materials. Two-dimensional transport model for single band semiconductor was applied to these materials. As results of the calculation it is found that carrier confinement by QWs mainly have effects on increasing the carrier energy and on shifting optimizing point of power factor /spl sigma/ /spl alpha//sup 2/. The calculated figure of merit for modulated doping Si/sub 70/Ge/sub 30/ QWs was the same as that of bulk material at 300 K. Modulated doping silicide QWs had larger figure of merit than that of Si/sub 70/Ge/sub 30/ QWs.
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