基于0.5-/spl mu/m BiCMOS技术的硅双极晶体管的制造和电学特性

A.F.A. Rahim, A.F.A. Rahim, M. R. Hashim, S.A.M. Saari, M. Ahmad, M. Wahab, W.S.W. Adini, M. I. Syono
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引用次数: 1

摘要

双极晶体管以其高电流驱动能力和电流增益而闻名,而CMOS晶体管则以其低功耗和小尺寸优势在集成电路市场占据主导地位。两种晶体管在同一芯片上的组合提供了具有高封装密度的高性能电路。在本工作中,充分利用0.5 /spl mu/m BiCMOS技术,实现了性能优化的硅双极晶体管。介绍了在马来西亚首次制造的双极晶体管的初步电学结果。通过优化发射极驱动温度和退火系统的选择,可以显著提高电气器件的性能。
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Fabrication and electrical characterization of silicon bipolar transistors in a 0.5-/spl mu/m based BiCMOS technology
Bipolar transistors are well known for their high current driving capability and current gains, while CMOS transistors are dominant in the integrated circuit market because of their low power consumption and small size advantage. The combination of both types of transistor on the same chip provides a high performance circuit with a high packing density. In this work, 0.5 /spl mu/m BiCMOS technology is fully utilized to realize silicon bipolar transistors with optimized performance. Preliminary electrical results are presented on bipolar transistors fabricated for the first time in Malaysia. Significant improvements in electrical device performance can be achieved by optimizing the emitter drive-in temperature and choice of annealing system.
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