A.F.A. Rahim, A.F.A. Rahim, M. R. Hashim, S.A.M. Saari, M. Ahmad, M. Wahab, W.S.W. Adini, M. I. Syono
{"title":"基于0.5-/spl mu/m BiCMOS技术的硅双极晶体管的制造和电学特性","authors":"A.F.A. Rahim, A.F.A. Rahim, M. R. Hashim, S.A.M. Saari, M. Ahmad, M. Wahab, W.S.W. Adini, M. I. Syono","doi":"10.1109/SMELEC.2000.932446","DOIUrl":null,"url":null,"abstract":"Bipolar transistors are well known for their high current driving capability and current gains, while CMOS transistors are dominant in the integrated circuit market because of their low power consumption and small size advantage. The combination of both types of transistor on the same chip provides a high performance circuit with a high packing density. In this work, 0.5 /spl mu/m BiCMOS technology is fully utilized to realize silicon bipolar transistors with optimized performance. Preliminary electrical results are presented on bipolar transistors fabricated for the first time in Malaysia. Significant improvements in electrical device performance can be achieved by optimizing the emitter drive-in temperature and choice of annealing system.","PeriodicalId":359114,"journal":{"name":"ICSE 2000. 2000 IEEE International Conference on Semiconductor Electronics. Proceedings (Cat. No.00EX425)","volume":"105 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-11-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Fabrication and electrical characterization of silicon bipolar transistors in a 0.5-/spl mu/m based BiCMOS technology\",\"authors\":\"A.F.A. Rahim, A.F.A. Rahim, M. R. Hashim, S.A.M. Saari, M. Ahmad, M. Wahab, W.S.W. Adini, M. I. Syono\",\"doi\":\"10.1109/SMELEC.2000.932446\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Bipolar transistors are well known for their high current driving capability and current gains, while CMOS transistors are dominant in the integrated circuit market because of their low power consumption and small size advantage. The combination of both types of transistor on the same chip provides a high performance circuit with a high packing density. In this work, 0.5 /spl mu/m BiCMOS technology is fully utilized to realize silicon bipolar transistors with optimized performance. Preliminary electrical results are presented on bipolar transistors fabricated for the first time in Malaysia. Significant improvements in electrical device performance can be achieved by optimizing the emitter drive-in temperature and choice of annealing system.\",\"PeriodicalId\":359114,\"journal\":{\"name\":\"ICSE 2000. 2000 IEEE International Conference on Semiconductor Electronics. Proceedings (Cat. No.00EX425)\",\"volume\":\"105 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2000-11-13\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"ICSE 2000. 2000 IEEE International Conference on Semiconductor Electronics. Proceedings (Cat. No.00EX425)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SMELEC.2000.932446\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"ICSE 2000. 2000 IEEE International Conference on Semiconductor Electronics. Proceedings (Cat. No.00EX425)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SMELEC.2000.932446","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Fabrication and electrical characterization of silicon bipolar transistors in a 0.5-/spl mu/m based BiCMOS technology
Bipolar transistors are well known for their high current driving capability and current gains, while CMOS transistors are dominant in the integrated circuit market because of their low power consumption and small size advantage. The combination of both types of transistor on the same chip provides a high performance circuit with a high packing density. In this work, 0.5 /spl mu/m BiCMOS technology is fully utilized to realize silicon bipolar transistors with optimized performance. Preliminary electrical results are presented on bipolar transistors fabricated for the first time in Malaysia. Significant improvements in electrical device performance can be achieved by optimizing the emitter drive-in temperature and choice of annealing system.