扫描探针光刻(SPL)纳米加工方法

Pengfei Fan, Xichun Luo
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引用次数: 1

摘要

越来越多的纳米电子学、高密度数据存储器件、纳米光子学、生物工程支架在细胞增殖方面的应用要求高通量、高精度的纳米制造方法。本文综述了扫描探针光刻纳米加工技术的原理、研究现状和特点。重点研究了热场、化学场、电场以及探针与衬底之间的作用力对声压级的影响。结果表明,机械SPL材料具有良好的制备能力,是未来纳米加工的发展方向。尽管如此,要真正实现工业规模生产,还必须克服当前加工效率低、针尖半径大小的限制等挑战。
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Scanning Probe Lithography (SPL) Nanofabrication Approach
More and more nanoelectronics, high density data storage devices, nanophotonics, scaffolds in bioengineering for cell proliferation applications demands on high-throughput and high-accuracy nanofabrication methods. This paper presents an overview of mechanism and research status and characteristics of a nanofabrication approach-scanning probe lithography. The focus is on the effects of thermal, chemistry, electric fields and force between probe and substrate on SPL. It concludes that the mechanical SPL demonstrates an outstanding fabrication ability and is a promising thread in the future nanofabrication approaches. Despite all this, it has to overcome current challenges in low processing efficiency and the restriction of the tip radius size to genuinely realize industrial scale production.
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