利用制程后自动选择性电荷注入降低CMOS逻辑电路的最小工作电压

Kentaro Honda, K. Ikeuchi, M. Nomura, M. Takamiya, T. Sakurai
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引用次数: 1

摘要

为了降低CMOS逻辑电路的最小工作电压(VDDmin),提出了一种利用衬底热电子(SHE)制造后自动选择电荷注入的方法,并设计了一种新的电路来利用这种方法来降低晶体管的模内随机阈值(VTH)变化。在新的电路中,开关被添加到组合逻辑电路中,以便将它们变成锁存环。为了降低VDDmin,通过仿真探讨了最优(1)回路拓扑结构、(2)回路级数、(3)每次注药的VTH位移和(4)注药试验次数的设计准则。通过将该方案应用于65纳米CMOS制造的96级逆变链,首次成功地将VDDmin从94mV降低到74mV。
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Reduction of minimum operating voltage (VDDmin) of CMOS logic circuits with post-fabrication automatically selective charge injection
In order to reduce minimum operating voltage (VDDmin) of CMOS logic circuits, a new method reducing the within-die random threshold (VTH) variation of transistors by a post-fabrication automatically selective charge injection using substrate hot electrons (SHE) is proposed along with novel circuitry to utilize this. In the new circuit, switches are added to combinational logic circuits in order to turn them into latch loops. In order to reduce VDDmin, design guides on the optimal (1) loop topology, (2) number of stages in a loop, (3) VTH shift per charge injection, and (4) number of charge injection trials are explored through simulations. By applying the proposed scheme to 96-stage inverter chain fabricated in 65-nm CMOS, the measured reduction of VDDmin from 94mV to 74mV is successfully demonstrated for the first time.
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