化学机械磁流变表面处理:表面处理的工艺机理、研究趋势、挑战和机遇

Yogendra Kumar, Harpreet Singh
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引用次数: 7

摘要

化学机械磁流变抛光(CMMRF)是一种结合化学机械抛光(CMP)和磁流变抛光(MRF)特点的纳米抛光方法。CMMRF工艺的设计考虑了精加工过程中发生的化学和机械效应。在材料加工科学领域,本文深入探讨了CMMRF方法的基本原理。评估了与CMMRF相关的潜在研究模式,并确定了它们的益处。此外,在满足所有工业需求的同时,还强调了提高CMMRF工艺能力的挑战,以及研究部门广泛的未来机会。本分析论文的发现也将帮助研究人员在先进的整理领域,以确定过程实现更好的结果。
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Chemomechanical magnetorheological finishing: Process mechanism, research trends, challenges and opportunities in surface finishing
Chemomechanical magnetorheological finishing (CMMRF) has emerged as a nanofinishing method that combines the characteristics of chemical mechanical polishing (CMP) and magneto-rheological finishing (MRF). The CMMRF process was designed to take into account both the chemical and mechanical effects that occur during the finishing process. In the field of material processing science, this article delves into the fundamentals of the CMMRF method. The potential research patterns linked to CMMRF are assessed and their benefits are determined. Furthermore, the challenges of improving CMMRF process capabilities, as well as the wide futuristic opportunities of the research sector, are emphasised, along with meeting all industrial needs. The findings of this analysis paper will also aid researchers in the field of advanced finishing in identifying process realisation for better results.
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