Sizing and optimization of low power process variation aware standard cells

The yield of low voltage digital circuits based on standard cell design is found to be sensitive to local gate delay and power variations due to uncorrelated intra-die parameter fluctuations. Caused by random nature of doping positions they lead to more pronounced deviations for minimum transistor sizes. The basic idea of this work is to optimize the transistor level single standard cells by making the cells more resistant for process variations.