IBAD- pld法长度YBCO线材的开发—IBAD中间层上的自定向PLD-CeO2帽层的长度化—

岳海 室賀, 成紀 宮田, 智則 渡部, 顕 衣斐, 穣 山田, 輝郎 和泉, 融 塩原, 丈晴 加藤, 司 平山
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引用次数: 1

摘要

我们发现,在IBAD- gd2zr2o7 (GZO)带上的PLD-CeO2帽层可以在没有离子束辅助(如IBAD工艺)的情况下实现高晶粒对准。我们称这种现象为“PLD-CeO2帽层中的自外延”。目前,我们正在利用Reel-to-Reel工艺开发IBAD-GZO磁带上自外延PLD-CeO2帽层的长磁带。得到了一个108 m长的带有PLD-CeO2帽层的胶带。缓冲层的δ phi值由iad - gzo的13.3 ~ 14.0°提高到PLD-CeO2的4.3 ~ 4.8°。PLD-CeO2帽层的制备速度可达5 ~ 6 m/h,而IBAD-GZO的制备速度为1 m/h。然后,我们尝试使用薄IBAD层和自外延PLD-CeO2帽层来提高总缓冲层的总体制造速度。在55 m长的iad - gzo带上以2.5 m/h的传输速度沉积了PLD-CeO2帽层,以2m /h的速度制备的δ phi值为23.1 ~ 24.0度,比传统的IBAD工艺快2倍。结果表明,PLD-CeO2帽层的δ phi值在8.6-10.4°范围内。缓冲层在所有工艺中的制造速度达到2米/小时。结果表明,PLD-CeO2能有效地提高材料的加工速度和晶粒取向。
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IBAD-PLD法長尺YBCO線材の開発 —IBAD中間層上における自己配向PLD-CeO2キャップ層の長尺化—
We found that a PLD-CeO2 cap layer on an IBAD-Gd2Zr2O7 (GZO) tape can make a high grain alignment without ion-beam assistance such as the IBAD process. We call this phenomenon “self-epitaxy in a PLD-CeO2 cap layer”. At present, we are developing long tapes by the Reel-to-Reel process for the self-epitaxial PLD-CeO2 cap layer on an IBAD-GZO tape. A 108 m-long tape with a PLD-CeO2 cap layer was obtained. The delta phi values of the buffer layer were improved to 4.3-4.8 degrees of PLD-CeO2 from 13.3-14.0 degrees of IBAD-GZO. Although the fabrication rate of the PLD-CeO2 cap layer was as fast as 5-6 m/h, that of the IBAD-GZO was 1 m/h. Then, we tried to improve the overall fabrication rate of the total buffer layers using a thin IBAD layer and the self-epitaxial PLD-CeO2 cap layer. A PLD-CeO2 cap layer was deposited at a tape transfer speed of 2.5 m/h on a 55 m-long IBAD-GZO tape with the delta phi values of 23.1-24.0 degrees fabricated at 2 m/h, which was two times faster than the conventional IBAD process. As a result, the delta phi values of the PLD-CeO2 cap layer were in the range of 8.6-10.4 degrees. The fabrication rate throughout all of the processes for buffer layers was achieved to be 2 m/h. It was found that PLD-CeO2 was effective for enhancing both the fabrication rate and grain alignment.
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