铁电/铁弹性双晶薄膜的可控纳米畴缺陷

Long-Xian Ding, C. Durkan
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引用次数: 1

摘要

由于铁电薄膜在非易失性存储器等许多领域的应用,在纳米尺度上得到了广泛的研究。采用增强压电响应力显微镜(E-PFM)研究了简单多铁PbZr0.3Ti0.7O3 (PZT)多晶薄膜中铁电畴和铁弹性纳米畴的演化。通过在原子力显微镜(AFM)尖端和样品底部衬底之间施加直流电压,我们创建了一个电场来切换畴的方向。观察到铁电畴和铁弹性畴以(111)为主取向向特定方向的可逆开关。我们还发现,随着铁电/铁弹性畴的切换,也有缺陷在切换。最后,我们从挠性电和缺陷钉接的角度提出了这种可控缺陷的可能解释。
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Controllable nanodomain defects in ferroelectric/ferroelastic biferroic thin films
Ferroelectric thin films have been intensively studied at the nanometre scale due to the application in many fields, such as non-volatile memories. Enhanced piezo-response force microscopy (E-PFM) was used to investigate the evolution of ferroelectric and ferroelastic nanodomains in a polycrystalline thin film of the simple multi-ferroic PbZr0.3Ti0.7O3 (PZT). By applying a d.c. voltage between the atomic force microscopy (AFM) tip and the bottom substrate of the sample, we created an electric field to switch the domain orientation. Reversible switching of both ferroelectric and ferroelastic domains towards particular directions with predominantly (111) domain orientations are observed. We also showed that along with the ferroelectric/ferroelastic domain switch, there are defects that also switch. Finally, we proposed the possible explanation of this controllable defect in terms of flexoelectricity and defect pinning.
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