足底矫形器对高足弓足足足压力及步态姿势影响的研究

Lin Li, Liang Yan, Xupeng Wang, Xinqin Gao
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摘要

由于高弓足的内侧纵弓过高,削弱了足弓的弹性。与正常足底的平衡力相比,高弓足的稳定性和缓冲性较差。足部矫形器可有效提高高足弓患者的动态足底负荷,减少足部损伤,缓解足部疲劳。本文分析并验证了足底矫形器对足底压力分布的影响以及高弓足患者的步态和姿势特征。采用JasencoJsp (jasenco, JSP-C5, France)足底压力测试系统和Sennotech Insole X动态步态分析系统对具有代表性的高弓足患者进行测试。采集穿戴足底矫形器前后足底压力分布、峰值压力、一个步态周期内的步态阶段、足部显微特征等数据。结果表明,足底矫形器能有效降低足底压力峰值,改善足底压力分布,使足底压力在前、中、后足分布相对均匀。同时改善足部运动时内旋不足,缓解足底筋膜过度紧张,减少内翻等步态异常的风险。
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Study on the effect of plantar orthosis on plantar pressure and gait & posture of high arched foot
Because the medial longitudinal arch of high arched foot is too high, the elasticity of the foot arch is weakened. Compared with the balanced force on the sole of normal foot, the stability and buffering of the high arched foot are poor. Foot orthosis can effectively improve the dynamic plantar load of patients with high arch, reduce foot injury and relieve foot fatigue. In this paper, the effect of plantar orthosis on plantar pressure distribution and the characteristics of gait and posture of patients with high arched foot are analyzed and verified. The JasencoJsp (jasenco, JSP-C5, France) plantar pressure test system and the Sennotech Insole X dynamic gait analysis system are used to test a representative patient with high arched foot. The data of plantar pressure distribution, peak pressure, gait phase within a gait cycle, as well as foot microscopic characteristics before and after wearing the plantar orthosis are collected. The results show that the plantar orthosis can effectively reduce the plantar peak pressure and improve the plantar pressure distribution, so that the plantar pressure is relatively evenly distributed in the front, middle and rear foot. At the same time, the insufficient pronation during foot movement has been improved, the excessive tension of plantar fascia has been alleviated and the risk of abnormal gait such as varus has been reduced.
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