{"title":"三维微电子物体二维模型的建模优化过程","authors":"S. Mironov, K. M. Zibarev","doi":"10.1109/CTS53513.2021.9562944","DOIUrl":null,"url":null,"abstract":"The article discusses the problem of optimizing the characteristics of microelectronic objects in the transition from abstract virtual layout models of cells to their layout drawings in real design rules. Optimization of the characteristics of microelectronic objects is provided by an original layout compaction algorithm based on a virtual coordinate grid, which simulates the actions of a layout designer to reduce parasitic parameters.","PeriodicalId":371882,"journal":{"name":"2021 IV International Conference on Control in Technical Systems (CTS)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2021-09-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Modeling the Optimization Process of 2-Dimensional Models of 3-Dimensional Microelectronic Objects\",\"authors\":\"S. Mironov, K. M. Zibarev\",\"doi\":\"10.1109/CTS53513.2021.9562944\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The article discusses the problem of optimizing the characteristics of microelectronic objects in the transition from abstract virtual layout models of cells to their layout drawings in real design rules. Optimization of the characteristics of microelectronic objects is provided by an original layout compaction algorithm based on a virtual coordinate grid, which simulates the actions of a layout designer to reduce parasitic parameters.\",\"PeriodicalId\":371882,\"journal\":{\"name\":\"2021 IV International Conference on Control in Technical Systems (CTS)\",\"volume\":\"1 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2021-09-21\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2021 IV International Conference on Control in Technical Systems (CTS)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/CTS53513.2021.9562944\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2021 IV International Conference on Control in Technical Systems (CTS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CTS53513.2021.9562944","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Modeling the Optimization Process of 2-Dimensional Models of 3-Dimensional Microelectronic Objects
The article discusses the problem of optimizing the characteristics of microelectronic objects in the transition from abstract virtual layout models of cells to their layout drawings in real design rules. Optimization of the characteristics of microelectronic objects is provided by an original layout compaction algorithm based on a virtual coordinate grid, which simulates the actions of a layout designer to reduce parasitic parameters.
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