T. Metcalf, B. Houston, J. E. Butler, T. Feygelson
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引用次数: 0
摘要
本文报道了在硅谐振器衬底上生长的几种纳米晶金刚石薄膜的力学性能-内摩擦和剪切模量-的测量。对掺硼和无硼纳米晶金刚石薄膜的内摩擦测量表明,硼浓度与先前报道的1-2 K内摩擦峰无关。相反,大量掺硼的薄膜在10 K处出现内摩擦峰。这些薄膜的低温内耗与之前报道的薄膜一致,在2 × 10-6 les Q-1 les 6 × 10-6的范围内
Low temperature mechanical properties of nanocrystalline diamond films
Measurements of the mechanical properties - internal friction and shear modulus - of several nanocrystalline diamond films grown on silicon resonator substrates is reported. The internal friction measurements of 0.5 mum boron-doped and boron-free nanocrystalline diamond films show that the boron concentration does not appear to be correlated with the previously reported internal friction peak at 1-2 K. Rather, a heavily boron-doped film appears to have an internal friction peak at 10 K. The low-temperature internal friction of these films is consistent with that of films reported upon earlier, and is in the range 2 times 10-6 les Q-1 les 6 times 10-6