双层石墨烯的堆叠失调

H. Raza, E. Kan
{"title":"双层石墨烯的堆叠失调","authors":"H. Raza, E. Kan","doi":"10.1109/IWCE.2009.5091155","DOIUrl":null,"url":null,"abstract":"The electronic-structure of a bilayer graphene is different from the single layer graphene due to coupling between the two layers. This coupling is a function of stacking distance as well as relative orientation of the two layers. We computationally study the electronic structure and electric-field modulation for these stacking misalignments in Bernal (Atilde - B) stacked bilayer graphene using the extended Huckel theory. We report that certain stacking misalignments, either induced from adjacent dielectrics or stress, would lead to various characteristics of electronic-structure and out-of-plane electric-field modulation, which can have a significant effect on band gap opening.","PeriodicalId":443119,"journal":{"name":"2009 13th International Workshop on Computational Electronics","volume":"23 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2009-05-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Stacking Misalignments in Bilayer Graphene\",\"authors\":\"H. Raza, E. Kan\",\"doi\":\"10.1109/IWCE.2009.5091155\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The electronic-structure of a bilayer graphene is different from the single layer graphene due to coupling between the two layers. This coupling is a function of stacking distance as well as relative orientation of the two layers. We computationally study the electronic structure and electric-field modulation for these stacking misalignments in Bernal (Atilde - B) stacked bilayer graphene using the extended Huckel theory. We report that certain stacking misalignments, either induced from adjacent dielectrics or stress, would lead to various characteristics of electronic-structure and out-of-plane electric-field modulation, which can have a significant effect on band gap opening.\",\"PeriodicalId\":443119,\"journal\":{\"name\":\"2009 13th International Workshop on Computational Electronics\",\"volume\":\"23 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2009-05-27\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2009 13th International Workshop on Computational Electronics\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IWCE.2009.5091155\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2009 13th International Workshop on Computational Electronics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IWCE.2009.5091155","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

由于双层石墨烯之间的耦合作用,双层石墨烯的电子结构不同于单层石墨烯。这种耦合是堆叠距离和两层相对方向的函数。我们利用扩展的Huckel理论计算研究了Bernal (Atilde - B)堆叠双层石墨烯中这些堆叠失调的电子结构和电场调制。我们报道了由邻近介质或应力引起的某些堆叠失调会导致电子结构和面外电场调制的各种特性,这些特性会对带隙打开产生重大影响。
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Stacking Misalignments in Bilayer Graphene
The electronic-structure of a bilayer graphene is different from the single layer graphene due to coupling between the two layers. This coupling is a function of stacking distance as well as relative orientation of the two layers. We computationally study the electronic structure and electric-field modulation for these stacking misalignments in Bernal (Atilde - B) stacked bilayer graphene using the extended Huckel theory. We report that certain stacking misalignments, either induced from adjacent dielectrics or stress, would lead to various characteristics of electronic-structure and out-of-plane electric-field modulation, which can have a significant effect on band gap opening.
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