PtSi/多孔Si肖特基势垒中的库仑阻滞作为二维多隧穿结

A. Erfanian, H. Mehrara, F. Raissi, M. Khaje
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引用次数: 2

摘要

作者报道了PtSi/多孔Si肖特基势垒中的库仑封锁效应。二维多隧结(2D-MTJ)模型可以解释该屏障的阻断特性。利用SIMON仿真器对该模型的电特性进行了研究。结果表明,模拟的电流-电压曲线与实测数据拟合较好,该模型可用于研究PtSi/多孔Si的肖特基势垒行为。根据这两项研究,在电流振荡中观察到库仑封锁现象,并使用2D-MTJ模型证明了该器件在低温(5 K)下的单电子效应。此外,它表明,通过随温度和高漏极电压增加电流值,PtSi/多孔Si肖特基势垒的行为类似于Raissi等人先前报道的单岛单电子隧穿(SET)结。
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Coulomb blockade in PtSi/porous Si Schottky barrier as a two-dimensional multi-tunnelling junction
The authors report on Coulomb blockade effect in the PtSi/porous Si Schottky barrier. A model of two-dimensional multi-tunnelling junction (2D-MTJ) can explain the blockade characteristic of this barrier. Using the SIMON simulator, the electrical characteristics of the proposed model were investigated. The results show that simulated current–voltage curves achieve a reasonable fit with the measured data and the present model can be used to study the PtSi/porous Si Schottky barrier behaviour. In accordance with both the studies, Coulomb blockade phenomenon is observed in current oscillation and single-electron effect of this device at low temperatures (5 K) is justified using the 2D-MTJ model. In addition, it indicates that by increasing the current value with temperature and for high drain voltages, PtSi/porous Si Schottky barrier behaves like a single island single-electron tunnelling (SET) junction as previously reported by Raissi et al.
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