用于高速和低功耗应用的无掺杂发射极InP/InGaAs hbt

M. Ida, K. Kurishima, H. Nakajima, N. Watanabe, S. Yamahata
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引用次数: 41

摘要

减小横向发射极尺寸是降低HBT集成电路功耗的有效途径。许多作者已经证明了亚微米hbt工作在>100 GHz的亚毫安电流下。另一方面,针对低电流操作优化垂直层结构的报道很少。在低电流下,hbt的主要延迟时间是发射极充电时间。因此,必须通过增加发射极耗尽层的厚度来减小发射极结电容。在本文中,我们提出了一种基于inp的hbt的无掺杂发射极结构,并研究了其对低功耗应用的影响。
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Undoped-emitter InP/InGaAs HBTs for high-speed and low-power applications
Scaling down the lateral emitter dimension is an effective way to reduce the power dissipation of HBT ICs. Various authors have demonstrated submicrometer HBTs operating at >100 GHz with submilliampere current. On the other hand, there have been few reports on vertical layer structures optimized for low-current operation. At low current, the dominant delay time of HBTs is the emitter charging time. Thus, it is essential to reduce the emitter junction capacitance by increasing the thickness of the emitter depletion layer. In this paper, we propose an undoped-emitter structure for InP-based HBTs and investigate its impact on low-power applications.
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