{"title":"系统广泛表征MOS和SOI MOS结构的手段,电荷泵","authors":"S. Szostak, L. Lukasiak, A. Jakubowski","doi":"10.1109/ICCDCS.2002.1004090","DOIUrl":null,"url":null,"abstract":"The performance of MOS devices is to a large extent determined by the quality of the Si-SiO/sub 2/ interface. This paper presents a new system for characterization of MOS and MOS SOI structures by means of charge pumping. MOSFETs and SOI MOSFETs are used as test structures.","PeriodicalId":416680,"journal":{"name":"Proceedings of the Fourth IEEE International Caracas Conference on Devices, Circuits and Systems (Cat. No.02TH8611)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2002-08-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"System for extensive characterization of MOS and SOI MOS structures by means of charge pumping\",\"authors\":\"S. Szostak, L. Lukasiak, A. Jakubowski\",\"doi\":\"10.1109/ICCDCS.2002.1004090\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The performance of MOS devices is to a large extent determined by the quality of the Si-SiO/sub 2/ interface. This paper presents a new system for characterization of MOS and MOS SOI structures by means of charge pumping. MOSFETs and SOI MOSFETs are used as test structures.\",\"PeriodicalId\":416680,\"journal\":{\"name\":\"Proceedings of the Fourth IEEE International Caracas Conference on Devices, Circuits and Systems (Cat. No.02TH8611)\",\"volume\":\"1 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2002-08-07\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings of the Fourth IEEE International Caracas Conference on Devices, Circuits and Systems (Cat. No.02TH8611)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICCDCS.2002.1004090\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of the Fourth IEEE International Caracas Conference on Devices, Circuits and Systems (Cat. No.02TH8611)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICCDCS.2002.1004090","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
System for extensive characterization of MOS and SOI MOS structures by means of charge pumping
The performance of MOS devices is to a large extent determined by the quality of the Si-SiO/sub 2/ interface. This paper presents a new system for characterization of MOS and MOS SOI structures by means of charge pumping. MOSFETs and SOI MOSFETs are used as test structures.