绝缘子平台上基于硅-铌酸锂杂化的高效光栅耦合器

IF 0.6 4区 工程技术 Q4 ENGINEERING, ELECTRICAL & ELECTRONIC Journal of Nanoelectronics and Optoelectronics Pub Date : 2023-08-01 DOI:10.1166/jno.2023.3461
Meng Liu, Xuan Zheng, Zisu Gong, Juan Li, Wenfei Liu, Renqi Gao
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引用次数: 0

摘要

本文研制并分析了一种基于铌酸锂(linbo3, LN)绝缘子(LNOI)平台(Si-LNOI)上硅薄膜的高效光栅耦合器。通过二维时域有限差分(2D-FDTD)仿真对光栅结构进行优化。数值研究了这些参数(如sio2、LNOI和Si的层厚)和光栅结构对耦合效率的影响。在λ =1550 nm处获得了超过98%的耦合效率。此外,系统地研究了光栅周期、填充系数、刻蚀深度和硅波导层厚度的偏差容限。结果表明具有较高的偏差容忍度。本研究提出的光栅耦合器除了蚀刻之外,不需要增加制作步骤,因此具有高耦合效率和低制作复杂度。
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A High Efficiency Grating Coupler Based on Hybrid Si-Lithium Niobate on Insulator Platform
In this paper, a high efficiency grating coupler based on the Si thin film on Lithium Niobate (LiNbO 3 , LN) on insulator (LNOI) platform (Si-LNOI) was developed and analyzed. Two-dimensional finite-different time-domain (2D-FDTD) simulations were performed to optimize the grating structure. Those parameters (e.g., the layer thickness of SiO 2 , LNOI, and Si) and grating configuration were numerically investigated for the coupling efficiency. A coupling efficiency exceeding 98% at λ =1550 nm was obtained for TE polarization. Furthermore, the deviation tolerances of the grating period, the filling factor, the etching depth, and the layer thickness of the Si waveguide layer were studied systematically. The results indicated a high deviation tolerance. The grating coupler presented in this study could be achieved without adding fabrication steps other than etching, thereby showing high coupling efficiency and low fabrication complexity.
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来源期刊
Journal of Nanoelectronics and Optoelectronics
Journal of Nanoelectronics and Optoelectronics 工程技术-工程:电子与电气
自引率
16.70%
发文量
48
审稿时长
12.5 months
期刊最新文献
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